The investigation of deposited organic carbon‐silicon films using cyclonic atmospheric pressure plasma polymerization

Background The upgrading of atmospheric‐pressure plasma polymerization process, the detailed investigation of atmospheric‐pressure plasma polymerization deposited organic carbon‐silicon film features is essential to obtain the further understandings into the optimizing coating techniques. Aim This investigation demonstrates plasma cyclone deposited film features with adjusting argon gas flow rate and HMDSN monomer flow rate. Method This study utilized the plasma cyclone system to polymerize a carbon‐silicon film. In this study, Optical Emission Spectroscopy (OES) was employed as a diagnostic tool to indirectly inspect the chemical composition of the atmospheric‐pressure plasma polymerization's glow discharge by detecting the photo‐emitting species. The Contact Angle Goniometer, ATR‐FTIR, AFM, and XPS were used to measure the surface properties of the films deposited by plasma cyclone. Results The static contact angle results show that most of the deposited films obtain the divergent contact angle values with adjusting argon gas flow rate and HMDSN monomer flow rate. ATR‐FTIR results show that argon gas flow rate and HMDSN monomer flow rate dominate the porosity of plasma cyclone deposited film surface. XPS and AFM analyses also detect the comparable trend of physicochemical characteristics of organic carbon‐silicon film with adjusting argon gas flow rate and HMDSN monomer flow rate. In summary, the organic carbon‐silicon films can be successfully polymerized by plasma cyclone. Conclusions The results refer that the organic carbon‐silicon film deposition on vanadium redox flow battery separator surface improved the electrolyte uptake of the cyclonic‐plasma‐coated separators was larger than that of a commercial separator. The objective of this research work is to investigate the polymerization of carbon‐silicon films via vacuum‐free plasma cyclone for use in vanadium redox flow batteries. The surface characteristics of the plasma cyclone‐deposited carbon‐silicon films were analyzed by adjusting the flow rates of argon gas and HMDSN monomer. The results indicate an improvement in electrolyte uptake.