The investigation of frequency dependent dielectric properties and ac conductivity by impedance spectroscopy in the Al/(Cu-doped Diamond Like Carbon)/Au structures
In order to perform metal-interlayer-semiconductor (MIS) Schottky diodes (SDs) with a greater barrier height (BH), various materials are used at M/S interface as interlayer. Here, the interlayer material's characteristics are crucial, notably the need for characteristics like substrate adhesion...
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Veröffentlicht in: | Journal of materials science. Materials in electronics 2023-05, Vol.34 (13), p.1118, Article 1118 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
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Zusammenfassung: | In order to perform metal-interlayer-semiconductor (MIS) Schottky diodes (SDs) with a greater barrier height (BH), various materials are used at M/S interface as interlayer. Here, the interlayer material's characteristics are crucial, notably the need for characteristics like substrate adhesion, thermal-stability, and low-resistance. Due to its exceptional qualities, diamond-like carbon (DLC), one of the favored materials, was chosen in this investigation. To create the Al/(Cu-DLC)/p-Si/Au MIS type SD in this case, a copper-doped diamond-like carbon (Cu-DLC) nanocomposite film was electrochemically formed as an interlayer. Scanning electron microscopy (SEM) was also used to evaluate the electrodeposited (Cu-DLC) film. The impedance spectroscopy (IS) technique was used to analyze the real-imaginary components of complex dielectric (
ε
′,
ε
″) and electric modulus (
M′
,
M″
), tangent-loss
(
tan
δ
)
and ac electrical conductivity
(
σ
ac
)
in wide range of frequency (3 kHz–3 MHz) and voltage (± 4.0 V). All these parameters derived from the impedance-measurements were found strong function of frequency and voltage at low-moderate frequencies due to a unique distribution of surface states
(
N
ss
)
at (Cu-DLC)/p-Si interface and interfacial/dipole polarizations. As frequency rises,
M′
and
M″
, values rise while
ε
′ and
ε
″ values decrease. |
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ISSN: | 0957-4522 1573-482X |
DOI: | 10.1007/s10854-023-10546-z |