Orthorhombic undoped κ-Ga2O3 epitaxial thin films for sensitive, fast, and stable direct X-ray detectors

Photoelectronic properties of orthorhombic undoped κ-Ga2O3 epitaxial thin films, grown on sapphire substrates by metal–organic vapour phase epitaxy, were evaluated under X-ray irradiation (CuKα line, 8.05 keV) for the first time. Photoresponse linearity at low dose-rates (varying in the 10–200 μGy s...

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Veröffentlicht in:Journal of materials chemistry. C, Materials for optical and electronic devices Materials for optical and electronic devices, 2023-03, Vol.11 (11), p.3759-3769
Hauptverfasser: Girolami, Marco, Bosi, Matteo, Serpente, Valerio, Mastellone, Matteo, Seravalli, Luca, Pettinato, Sara, Salvatori, Stefano, Trucchi, Daniele M, nari, Roberto
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Sprache:eng
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Zusammenfassung:Photoelectronic properties of orthorhombic undoped κ-Ga2O3 epitaxial thin films, grown on sapphire substrates by metal–organic vapour phase epitaxy, were evaluated under X-ray irradiation (CuKα line, 8.05 keV) for the first time. Photoresponse linearity at low dose-rates (varying in the 10–200 μGy s−1 range), and excellent detection sensitivity (up to 342.3 μC Gy−1 cm−3), were demonstrated even at very low applied electric fields (down to 0.001 V μm−1). Photocurrent rise time was evaluated to be
ISSN:2050-7526
2050-7534
DOI:10.1039/d2tc05297k