Effect of temperature and photoperiod on symptoms associated with resistance toPhytophthora infestans after leaf penetration in susceptible and resistant potato cultivars

The effect of temperature and photoperiod on the expression of resistance againstPhytophthora infestansin five potato cultivars with and without resistance (R) genes was investigated. Four experiments were carried out under controlled conditions in growth chambers. Two cultivars (393295.236 and 391046.22) without known R genes from the International Potato Center (CIP) in Lima, Peru, two Mexican cultivars with major R genes (Tollocan and Malinche), and a susceptible cultivar (Atlantic) were used in this study. Plants were grown for 32 days in growth chambers at two temperatures (16 and 24 C) and two photoperiods (12 and 16 h day length), then inoculated with a compatible isolate ofP. infestansand incubated in a mist chamber at 18 C. The inoculation efficiency, the percentage of lesions that did not grow beyond the inoculation spot, the sporangia density, and the AUDPC were recorded. The percentage of arrested lesions decreased with temperature in the two most resistant cultivars (393295.236 and Malinche), and the AUDPC was lower at 16 than at 24 C in four of the five cultivars. The inoculation efficiency and the sporangia density were not affected by change in temperature. Sporangia density increased at 16 h photoperiod; however, the final infected leaf area was not affected. Our results demonstrate that the expression of horizontal and vertical resistance was affected by temperature; however, the relative resistance ranking among cultivars was the same in the four experiments with different temperatures and photoperiods. It is assumed that the resistance in the Mexican cultivars may be conferred by minor resistance genes and by the residual effect of defeated R genes. These results emphasize the difficulty in differentiating between horizontal and vertical resistance.