Fabrication of SiO:CH Particle-agglomerated Films by PECVD with Vinyl-group Organosilicon Reactants

Particle-agglomerated films exhibit rough surfaces, which can be suitable for realization of ultra hydrophobicity. We fabricated particles and their deposits of silica with organic functional groups (SiO:CH) by plasma polymerization of organosilicon reactants including methyl and vinyl functional gr...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2022/12/16, Vol.35(3), pp.283-287
Hauptverfasser:	Nakaizumi, Yuki, Hasegawa, K., Inoue, Yasushi, Takai, Osamu
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition Functional groups Hydrophobicity Organosilicon reactant Particle agglomeration Particle deposition Plasma-enhanced chemical vapor deposition Polymerization Silanes
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Beschreibung
Zusammenfassung:	Particle-agglomerated films exhibit rough surfaces, which can be suitable for realization of ultra hydrophobicity. We fabricated particles and their deposits of silica with organic functional groups (SiO:CH) by plasma polymerization of organosilicon reactants including methyl and vinyl functional groups. The trimethyl(vinyl)silane reactant showed a uniform deposition of the plasma-polymerized SiO:CH particles in a large area, while the trimethyl (vinyloxy)silane exhibited a localized particle deposition.
ISSN:	0914-9244 1349-6336
DOI:	10.2494/photopolymer.35.283