Low-frequency noise in ZrS3 van der Waals semiconductor nanoribbons

We report the results of the investigation of low-frequency electronic noise in ZrS3 van der Waals semiconductor nanoribbons. The test structures were of the back-gated field-effect-transistor type with a normally off n-channel and an on-to-off ratio of up to four orders of magnitude. The current–vo...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Applied physics letters 2023-02, Vol.122 (9)
Hauptverfasser: Rehman, A., Cywinski, G., Knap, W., Smulko, J., Balandin, A. A., Rumyantsev, S.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We report the results of the investigation of low-frequency electronic noise in ZrS3 van der Waals semiconductor nanoribbons. The test structures were of the back-gated field-effect-transistor type with a normally off n-channel and an on-to-off ratio of up to four orders of magnitude. The current–voltage transfer characteristics revealed significant hysteresis owing to the presence of deep levels. The noise in ZrS3 nanoribbons had spectral density SI ∼ 1/fγ (f is the frequency) with γ = 1.3–1.4 within the whole range of the drain and gate bias voltages. We used light illumination to establish that the noise is due to generation–recombination, owing to the presence of deep levels, and determined the energies of the defects that act as the carrier trapping centers in ZrS3 nanoribbons.
ISSN:0003-6951
1077-3118
DOI:10.1063/5.0143641