Synthesis of Highly Ordered Si-Containing Fluorinated Block Copolymers

Synthesis of Highly Ordered Si-Containing Fluorinated Block Copolymers

Series of Si-containing, especially polyhedral oligomeric silsesquioxane (POSS)-containing fluorinated block copolymers (BCPs), poly(styryl polyhedral oligomeric silsesquioxane)-block-poly(hepatafluorobutyl methacrylate) (PStPOSS-b-PHFBMA) were synthesized via living polymerizations. The flory-huggi...

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Veröffentlicht in:Journal of Photopolymer Science and Technology 2021/06/11, Vol.34(4), pp.329-334
Hauptverfasser: Zhou, Jianuo, Li, Xuemiao, Deng, Hai
Format: Artikel
Sprache:eng
Schlagworte:
Block copolymers
DSA
Electron microscopes
Fluorinated BCP
Fluorination
Gravimetric analysis
Hexagonal line
Organic-inorganic hybrid
Polyhedral oligomeric silsesquioxane
POSS
POSS BCP
Thermal analysis
Thermodynamics
Thermogravimetric analysis
X-ray scattering
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Zusammenfassung:Series of Si-containing, especially polyhedral oligomeric silsesquioxane (POSS)-containing fluorinated block copolymers (BCPs), poly(styryl polyhedral oligomeric silsesquioxane)-block-poly(hepatafluorobutyl methacrylate) (PStPOSS-b-PHFBMA) were synthesized via living polymerizations. The flory-huggins parameter (χ, at 150 ºC) of PStPOSS-b-PHFBMA BCP was 0.060. Highly ordered hexagonal domain with 13.2 nm d-spacing was observed by small-angle X-ray scattering (SAXS) after 10 h 160 ºC annealing, exhibiting rough line patterns in scanning electron microscope (SEM). SiO1.5 residue (13.7 wt%) still remained after 700 ºC sintering in thermal gravimetric analysis (TGA).
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.34.329