In situ infrared spectroscopy depth profilometer for organic thin films

Organic films are widely used in organic optoelectronics due to their flexibility, low-cost fabrication, and ability to be processed over large areas. Typically, the composition of these thin films varies along the film depth direction. In this work, we present a home-developed in situ instrument comprised of a capacitive coupled plasma generator in combination with a Fourier transform infrared spectrometer, to measure the composition distribution along the film-normal direction. During the measurement, the film is sequentially etched by the soft plasma and the evolution of the infrared spectra of the film is in situ monitored by a spectrometer, from which the film-depth-dependent infrared spectra are extracted. The film-depth resolution of this analytical method has been improved to ∼1 nanometer. Thus, it is possible to calculate the composition that varies with depth by utilizing this analysis method. This equipment, which can be applied effectively to the characterization of thin films for both conjugated and unconjugated organic molecules by directly measuring their distinctive molecular vibration signatures, is simple and clear to set up in a large number of laboratories.