Successional Heterostructure MoS2-Ni3S2 Nanospheres Based on 3D Nano-porous Ni: An Efficient Electrocatalyst for Overall Water Splitting
A rich reserve, low-cost electrocatalyst with high-efficiency catalytic activity is supposed to be a promising substitute for Pt-based noble metal electrocatalysts. Herein, we produced a heterostructure MoS2-Ni3S2 nanosphere on 3D nano-porous Ni through a novel synthetic strategy. Benefiting from th...
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Veröffentlicht in: | Journal of alloys and compounds 2022-11, Vol.920, p.165243, Article 165243 |
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Sprache: | eng |
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Zusammenfassung: | A rich reserve, low-cost electrocatalyst with high-efficiency catalytic activity is supposed to be a promising substitute for Pt-based noble metal electrocatalysts. Herein, we produced a heterostructure MoS2-Ni3S2 nanosphere on 3D nano-porous Ni through a novel synthetic strategy. Benefiting from the unique nanospherical heterostructure MoS2-Ni3S2 catalyst exhibits relatively low overpotentials of η10 = 109mV and Tafel slope of 81mV dec-1 for HER, η10 = 130mV and 91mV dec-1 for OER. Using heterostructure MoS2-Ni3S2 as bifunctional electrocatalysts, a low cell voltage of 1.49V was required to reach a current density of 10mAcm-2. The outstanding performance of heterostructure MoS2-Ni3S2 is attributed to the fast charge transfer channel offered by the interface between MoS2 and Ni3S2 as well as the large surface area provided by the nanospherical structure. This work elaborates a feasible measure to realize the non-noble and high-efficiency electrocatalysts and is instructive for the design of interface engineering and nanostructures.
•We obtained nanospherical catalyst on nanoporous Ni by a novel synthetic approach.•The unique nanospherical morphology combined with nanopores significantly increase surface area with numerous active sites.•The heterostructure MoS2-Ni3S2 is formed by doping S, which accelerates the whole reaction kinetics.•The MoS2-Ni3S2 catalyst exhibits excellent HER and OER activity and stability in KOH solution. |
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ISSN: | 0925-8388 1873-4669 |
DOI: | 10.1016/j.jallcom.2022.165243 |