Ion‐Implantation in Titania‐Based Plasmonic Photo‐anodes: A Review

The metal‐oxide semiconductors exhibit remarkable optoelectronic properties and have immense implication in applications involving energy conversion, light emission, environmental remediation, etc. The presence of metal nanostructures in titanium dioxide (TiO2), zinc oxide metal‐oxide semiconductors have enhanced the photo‐activity, due to the plasmon resonances and are predominantly researched for organic and perovskite photovoltaics. Generally, the metal nanoparticle dopants are introduced by methods like sputtering, sol–gel, etc. However, compared with conventional doping methods, ion‐implantation technique is a purely physical process, and a high controllability and repeatability can be achieved. Here, the current status of synthesis of nanocomposites in TiO2‐based photo‐anodic applications by ion‐implantation method is reviewed, and there is no elaborate review on this topic. Finally, the future prospects of ion‐implantation technique for controlling the excitonic behavior in TiO2 are discussed. This review article is the first elaborate one on ion‐implantation in titania‐based plasmonic photo‐anodes. With a tutorial‐like approach, an overview and the fundamentals of the ion‐implantation method is covered. The beneficial utilization of ion‐implantation in photocatalysis, photo‐electrochemical water splitting, and photovoltaic applications is elaborated. This technique holds great promise to research the exciton dynamics in titania.