High-Performance Large-Scale Atomistic Simulation of Thin Films Deposition

High-Performance Large-Scale Atomistic Simulation of Thin Films Deposition

The high-performance molecular dynamics simulation of the ion-assisted deposition of thin films is performed. The most time-consuming computational procedures are discussed. The structural parameters of the deposited films, depending on the deposition conditions, are calculated and verified using ex...

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Veröffentlicht in:Lobachevskii journal of mathematics 2022-04, Vol.43 (4), p.857-863
Hauptverfasser: Grigoriev, F. V., Sulimov, V. B., Tikhonravov, A. V.
Format: Artikel
Sprache:eng
Schlagworte:
Algebra
Analysis
Geometry
Ion beam assisted deposition
Mathematical Logic and Foundations
Mathematics
Mathematics and Statistics
Molecular dynamics
Probability Theory and Stochastic Processes
Thin films
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Zusammenfassung:The high-performance molecular dynamics simulation of the ion-assisted deposition of thin films is performed. The most time-consuming computational procedures are discussed. The structural parameters of the deposited films, depending on the deposition conditions, are calculated and verified using experimental data.
ISSN:1995-0802
1818-9962
DOI:10.1134/S1995080222070137