Comparison of STM and AFM Measurements of Mo Thin Films with the Kardar–Parisi–Zhang Model
Scanning tunneling microscopy and atomic force microscopy were used to study the topography of epitaxial Mo films of small thicknesses grown on the R -plane of sapphire. The domain of parameters of the Kardar–Parisi–Zhang model for the evolution of film surface profile in which it corresponds to the...
Gespeichert in:
Veröffentlicht in: | Technical physics 2022-02, Vol.67 (2), p.61-68 |
---|---|
Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 68 |
---|---|
container_issue | 2 |
container_start_page | 61 |
container_title | Technical physics |
container_volume | 67 |
creator | Fomin, L. A. Malikov, I. V. Berezin, V. A. Rassadin, A. E. Loginov, A. B. Loginov, B. A. |
description | Scanning tunneling microscopy and atomic force microscopy were used to study the topography of epitaxial Mo films of small thicknesses grown on the
R
-plane of sapphire. The domain of parameters of the Kardar–Parisi–Zhang model for the evolution of film surface profile in which it corresponds to the experimental results is found. |
doi_str_mv | 10.1134/S1063784222010054 |
format | Article |
fullrecord | <record><control><sourceid>gale_proqu</sourceid><recordid>TN_cdi_proquest_journals_2691813387</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><galeid>A710881170</galeid><sourcerecordid>A710881170</sourcerecordid><originalsourceid>FETCH-LOGICAL-c237t-50ef79603170eff7faa6dd6a7f14ceb5bbbb82bb0335da304c7261a64208fa283</originalsourceid><addsrcrecordid>eNp1kMFKAzEQhhdRsFYfwFvA82om2U3SYylWxRaF1osHl-xu0k3pJjXZIt58B9_QJzFLBQ9i5pCfmf-bGSZJzgFfAtDsagGYUS4yQggGjPPsIBkAHuGU5SQ_7DWjaV8_Tk5CWGMMIHI2SF4mrt1Kb4KzyGm0WM6RtDUaT-dormTYedUq24W-Nndo2RiLpmbTBvRmugZ1jUL30tfSf318PvZtTBTPjbSraK_V5jQ50nIT1NnPP0yeptfLyW06e7i5m4xnaUUo79IcK81HDFPgUWmupWR1zSTXkFWqzMv4BClLTGleS4qzihMGkmUECy2JoMPkYt93693rToWuWLudt3FkQdgIBFAqeHRd7l0ruVGFsdp1XlYxatWaylmlTcyPOWAhIK4SAdgDlXcheKWLrTet9O8F4KK_e_Hn7pEheyZEr10p_7vK_9A35bWEcg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2691813387</pqid></control><display><type>article</type><title>Comparison of STM and AFM Measurements of Mo Thin Films with the Kardar–Parisi–Zhang Model</title><source>SpringerLink Journals</source><creator>Fomin, L. A. ; Malikov, I. V. ; Berezin, V. A. ; Rassadin, A. E. ; Loginov, A. B. ; Loginov, B. A.</creator><creatorcontrib>Fomin, L. A. ; Malikov, I. V. ; Berezin, V. A. ; Rassadin, A. E. ; Loginov, A. B. ; Loginov, B. A.</creatorcontrib><description>Scanning tunneling microscopy and atomic force microscopy were used to study the topography of epitaxial Mo films of small thicknesses grown on the
R
-plane of sapphire. The domain of parameters of the Kardar–Parisi–Zhang model for the evolution of film surface profile in which it corresponds to the experimental results is found.</description><identifier>ISSN: 1063-7842</identifier><identifier>EISSN: 1090-6525</identifier><identifier>DOI: 10.1134/S1063784222010054</identifier><language>eng</language><publisher>Moscow: Pleiades Publishing</publisher><subject>Atomic force microscopy ; Classical and Continuum Physics ; Dielectric films ; Epitaxial growth ; Epitaxy ; Physics ; Physics and Astronomy ; Sapphire ; Scanning tunneling microscopy ; Thickness ; Thin films</subject><ispartof>Technical physics, 2022-02, Vol.67 (2), p.61-68</ispartof><rights>Pleiades Publishing, Ltd. 2022. ISSN 1063-7842, Technical Physics, 2022, Vol. 67, No. 2, pp. 61–68. © Pleiades Publishing, Ltd., 2022. ISSN 1063-7842, Technical Physics, 2022. © Pleiades Publishing, Ltd., 2022. Russian Text © The Author(s), 2021, published in Zhurnal Tekhnicheskoi Fiziki, 2021, Vol. 91, No. 10, pp. 1466–1473.</rights><rights>COPYRIGHT 2022 Springer</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c237t-50ef79603170eff7faa6dd6a7f14ceb5bbbb82bb0335da304c7261a64208fa283</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1134/S1063784222010054$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1134/S1063784222010054$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,41488,42557,51319</link.rule.ids></links><search><creatorcontrib>Fomin, L. A.</creatorcontrib><creatorcontrib>Malikov, I. V.</creatorcontrib><creatorcontrib>Berezin, V. A.</creatorcontrib><creatorcontrib>Rassadin, A. E.</creatorcontrib><creatorcontrib>Loginov, A. B.</creatorcontrib><creatorcontrib>Loginov, B. A.</creatorcontrib><title>Comparison of STM and AFM Measurements of Mo Thin Films with the Kardar–Parisi–Zhang Model</title><title>Technical physics</title><addtitle>Tech. Phys</addtitle><description>Scanning tunneling microscopy and atomic force microscopy were used to study the topography of epitaxial Mo films of small thicknesses grown on the
R
-plane of sapphire. The domain of parameters of the Kardar–Parisi–Zhang model for the evolution of film surface profile in which it corresponds to the experimental results is found.</description><subject>Atomic force microscopy</subject><subject>Classical and Continuum Physics</subject><subject>Dielectric films</subject><subject>Epitaxial growth</subject><subject>Epitaxy</subject><subject>Physics</subject><subject>Physics and Astronomy</subject><subject>Sapphire</subject><subject>Scanning tunneling microscopy</subject><subject>Thickness</subject><subject>Thin films</subject><issn>1063-7842</issn><issn>1090-6525</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><recordid>eNp1kMFKAzEQhhdRsFYfwFvA82om2U3SYylWxRaF1osHl-xu0k3pJjXZIt58B9_QJzFLBQ9i5pCfmf-bGSZJzgFfAtDsagGYUS4yQggGjPPsIBkAHuGU5SQ_7DWjaV8_Tk5CWGMMIHI2SF4mrt1Kb4KzyGm0WM6RtDUaT-dormTYedUq24W-Nndo2RiLpmbTBvRmugZ1jUL30tfSf318PvZtTBTPjbSraK_V5jQ50nIT1NnPP0yeptfLyW06e7i5m4xnaUUo79IcK81HDFPgUWmupWR1zSTXkFWqzMv4BClLTGleS4qzihMGkmUECy2JoMPkYt93693rToWuWLudt3FkQdgIBFAqeHRd7l0ruVGFsdp1XlYxatWaylmlTcyPOWAhIK4SAdgDlXcheKWLrTet9O8F4KK_e_Hn7pEheyZEr10p_7vK_9A35bWEcg</recordid><startdate>20220201</startdate><enddate>20220201</enddate><creator>Fomin, L. A.</creator><creator>Malikov, I. V.</creator><creator>Berezin, V. A.</creator><creator>Rassadin, A. E.</creator><creator>Loginov, A. B.</creator><creator>Loginov, B. A.</creator><general>Pleiades Publishing</general><general>Springer</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20220201</creationdate><title>Comparison of STM and AFM Measurements of Mo Thin Films with the Kardar–Parisi–Zhang Model</title><author>Fomin, L. A. ; Malikov, I. V. ; Berezin, V. A. ; Rassadin, A. E. ; Loginov, A. B. ; Loginov, B. A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c237t-50ef79603170eff7faa6dd6a7f14ceb5bbbb82bb0335da304c7261a64208fa283</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>Atomic force microscopy</topic><topic>Classical and Continuum Physics</topic><topic>Dielectric films</topic><topic>Epitaxial growth</topic><topic>Epitaxy</topic><topic>Physics</topic><topic>Physics and Astronomy</topic><topic>Sapphire</topic><topic>Scanning tunneling microscopy</topic><topic>Thickness</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Fomin, L. A.</creatorcontrib><creatorcontrib>Malikov, I. V.</creatorcontrib><creatorcontrib>Berezin, V. A.</creatorcontrib><creatorcontrib>Rassadin, A. E.</creatorcontrib><creatorcontrib>Loginov, A. B.</creatorcontrib><creatorcontrib>Loginov, B. A.</creatorcontrib><collection>CrossRef</collection><jtitle>Technical physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fomin, L. A.</au><au>Malikov, I. V.</au><au>Berezin, V. A.</au><au>Rassadin, A. E.</au><au>Loginov, A. B.</au><au>Loginov, B. A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Comparison of STM and AFM Measurements of Mo Thin Films with the Kardar–Parisi–Zhang Model</atitle><jtitle>Technical physics</jtitle><stitle>Tech. Phys</stitle><date>2022-02-01</date><risdate>2022</risdate><volume>67</volume><issue>2</issue><spage>61</spage><epage>68</epage><pages>61-68</pages><issn>1063-7842</issn><eissn>1090-6525</eissn><abstract>Scanning tunneling microscopy and atomic force microscopy were used to study the topography of epitaxial Mo films of small thicknesses grown on the
R
-plane of sapphire. The domain of parameters of the Kardar–Parisi–Zhang model for the evolution of film surface profile in which it corresponds to the experimental results is found.</abstract><cop>Moscow</cop><pub>Pleiades Publishing</pub><doi>10.1134/S1063784222010054</doi><tpages>8</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1063-7842 |
ispartof | Technical physics, 2022-02, Vol.67 (2), p.61-68 |
issn | 1063-7842 1090-6525 |
language | eng |
recordid | cdi_proquest_journals_2691813387 |
source | SpringerLink Journals |
subjects | Atomic force microscopy Classical and Continuum Physics Dielectric films Epitaxial growth Epitaxy Physics Physics and Astronomy Sapphire Scanning tunneling microscopy Thickness Thin films |
title | Comparison of STM and AFM Measurements of Mo Thin Films with the Kardar–Parisi–Zhang Model |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T09%3A33%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-gale_proqu&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Comparison%20of%20STM%20and%20AFM%20Measurements%20of%20Mo%20Thin%20Films%20with%20the%20Kardar%E2%80%93Parisi%E2%80%93Zhang%20Model&rft.jtitle=Technical%20physics&rft.au=Fomin,%20L.%20A.&rft.date=2022-02-01&rft.volume=67&rft.issue=2&rft.spage=61&rft.epage=68&rft.pages=61-68&rft.issn=1063-7842&rft.eissn=1090-6525&rft_id=info:doi/10.1134/S1063784222010054&rft_dat=%3Cgale_proqu%3EA710881170%3C/gale_proqu%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2691813387&rft_id=info:pmid/&rft_galeid=A710881170&rfr_iscdi=true |