A general method for growth of perovskite single-crystal arrays for high performance photodetectors

Perovskite single-crystal arrays have attracted intensive attention because of their great potentials for integrated optoelectronic devices. However, the traditional top-down lithography strategy requires complex processing and is detrimental to perovskite crystal structures, which is incompatible to directly pattern perovskite single crystals. Herein, we report a lithography-free method to realize the controllable growth of perovskite single-crystal arrays. Through introducing a printed hydrophilic-hydrophobic substrate into the crystallization system, the MAPbCl 3 single-crystal arrays with precise location and uniform size are effectively fabricated. This method can be applied to prepare diverse perovskite single-crystal arrays, including MAPbBr 3 , CsPbCl 3 , CsPbBr 3 , Cs 3 Cu 2 I 5 , Cs 3 Bi 2 I 9 , and (BA) 2 (MA) 3 Pb 4 I 11 . The perovskite single crystals can be selectively grown on the electrodes to fabricate ultraviolet photodetectors. The strategy demonstrates a facile approach to fabricate large-scale perovskite single-crystal arrays and opens a pathway to produce diverse perovskite optoelectronic devices.