P‐28: Development of Low‐Resistivity Gate‐Metal Process for LTPS‐TFT‐Array Backplane Applications
We fabricated and characterized Low‐Temperature Polycrystalline‐Silicon Thin‐Film Transistors (LTPS TFTs) with low resistivity gate metal on a glass substrate, which can be applied to high refresh driving products. And the technology has been integrated to a gaming‐laptops liquid crystal display and...
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Veröffentlicht in: | SID International Symposium Digest of technical papers 2022-06, Vol.53 (1), p.1141-1144 |
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creator | Ye, Jia-Hong Huang, Ching-Liang Huang, Kuo-Yu Chen, Maw-Song Guo, Wen-Rei Huang, Wei-Ming Wu, Yang-An |
description | We fabricated and characterized Low‐Temperature Polycrystalline‐Silicon Thin‐Film Transistors (LTPS TFTs) with low resistivity gate metal on a glass substrate, which can be applied to high refresh driving products. And the technology has been integrated to a gaming‐laptops liquid crystal display and demonstrated. This new LTPS TFTs backplane technology is promising integration for various displays, such as current driving like displays and LCD display. |
doi_str_mv | 10.1002/sdtp.15703 |
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This new LTPS TFTs backplane technology is promising integration for various displays, such as current driving like displays and LCD display.</description><subject>Backplanes</subject><subject>Electrical resistivity</subject><subject>Glass substrates</subject><subject>high frame rate driving</subject><subject>Liquid crystal displays</subject><subject>low resistivity metal</subject><subject>LTPS TFTs</subject><subject>Semiconductor devices</subject><subject>Thin film transistors</subject><issn>0097-966X</issn><issn>2168-0159</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><recordid>eNp9kE1OwzAQhS0EEqWw4QSW2CGl2HH-zK5QWpCCiGiQ2FlOYktp0zjYbqvsOAJn5CS4hDWbmdG8b2Y0D4BLjCYYIf_GVLab4DBG5AiMfBwlHsIhPQYjhGjs0Sh6PwVnxqwQIiQI6Aiss-_PLz-5hTOxE43qNqK1UEmYqr0TXoWpja13te3hglvhWs_C8gZmWpXCGCiVhmmeLZ2Qz3MXp1rzHt7xct01vBVw2nVNXXJbq9acgxPJGyMu_vIYvM0f8vtHL31ZPN1PU6_EQUS8RNAwKUVcYBFiiXhV8TgIJKG0iFCAw4qE7kFaoYLihBQoCCtakahKJJcxd-UYXA17O60-tsJYtlJb3bqTzI8STGKKIuSo64EqtTJGC8k6XW-47hlG7GAmO5jJfs10MB7gfd2I_h-SLWd5Nsz8ALQTe7M</recordid><startdate>202206</startdate><enddate>202206</enddate><creator>Ye, Jia-Hong</creator><creator>Huang, Ching-Liang</creator><creator>Huang, Kuo-Yu</creator><creator>Chen, Maw-Song</creator><creator>Guo, Wen-Rei</creator><creator>Huang, Wei-Ming</creator><creator>Wu, Yang-An</creator><general>Wiley Subscription Services, Inc</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SC</scope><scope>7SP</scope><scope>8FD</scope><scope>JQ2</scope><scope>L7M</scope><scope>L~C</scope><scope>L~D</scope></search><sort><creationdate>202206</creationdate><title>P‐28: Development of Low‐Resistivity Gate‐Metal Process for LTPS‐TFT‐Array Backplane Applications</title><author>Ye, Jia-Hong ; Huang, Ching-Liang ; Huang, Kuo-Yu ; Chen, Maw-Song ; Guo, Wen-Rei ; Huang, Wei-Ming ; Wu, Yang-An</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c1463-8e958ce7b1e51f0adda744f399b60415d355709d0b9183b045d9d36d8faf7a9d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>Backplanes</topic><topic>Electrical resistivity</topic><topic>Glass substrates</topic><topic>high frame rate driving</topic><topic>Liquid crystal displays</topic><topic>low resistivity metal</topic><topic>LTPS TFTs</topic><topic>Semiconductor devices</topic><topic>Thin film transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ye, Jia-Hong</creatorcontrib><creatorcontrib>Huang, Ching-Liang</creatorcontrib><creatorcontrib>Huang, Kuo-Yu</creatorcontrib><creatorcontrib>Chen, Maw-Song</creatorcontrib><creatorcontrib>Guo, Wen-Rei</creatorcontrib><creatorcontrib>Huang, Wei-Ming</creatorcontrib><creatorcontrib>Wu, Yang-An</creatorcontrib><collection>CrossRef</collection><collection>Computer and Information Systems Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Computer and Information Systems Abstracts Academic</collection><collection>Computer and Information Systems Abstracts Professional</collection><jtitle>SID International Symposium Digest of technical papers</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ye, Jia-Hong</au><au>Huang, Ching-Liang</au><au>Huang, Kuo-Yu</au><au>Chen, Maw-Song</au><au>Guo, Wen-Rei</au><au>Huang, Wei-Ming</au><au>Wu, Yang-An</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>P‐28: Development of Low‐Resistivity Gate‐Metal Process for LTPS‐TFT‐Array Backplane Applications</atitle><jtitle>SID International Symposium Digest of technical papers</jtitle><date>2022-06</date><risdate>2022</risdate><volume>53</volume><issue>1</issue><spage>1141</spage><epage>1144</epage><pages>1141-1144</pages><issn>0097-966X</issn><eissn>2168-0159</eissn><abstract>We fabricated and characterized Low‐Temperature Polycrystalline‐Silicon Thin‐Film Transistors (LTPS TFTs) with low resistivity gate metal on a glass substrate, which can be applied to high refresh driving products. 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subjects | Backplanes Electrical resistivity Glass substrates high frame rate driving Liquid crystal displays low resistivity metal LTPS TFTs Semiconductor devices Thin film transistors |
title | P‐28: Development of Low‐Resistivity Gate‐Metal Process for LTPS‐TFT‐Array Backplane Applications |
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