55‐2: Roll‐to‐Plate Nanoimprint Lithography as Etching Mask Creating Large‐Area Structured Surfaces

This paper explains how large area Roll‐to‐Plate (R2P) Nanoimprinting is combined with Reactive Ion Etching (RIE) to address the emerging needs of a variety of demanding products. In this process sequence, the scalable R2P imprint process is used to apply a structured mask to the functional surface. In a subsequent etching step the texture is transferred into the layer underneath. Using nanoimprinting and dry‐etching in combination is a powerful method for creating large‐area metal structured surfaces or optical structures in glass while improving mechanical durability and optical clarity at reduced costs and in larger volumes.