Graphoepitaxial Y:ZrO2 films on vicinal (110) NdGaO3 substrates by pulsed laser deposition

Thin films of Y:ZrO 2 (YSZ) have been grown on vicinal NdGaO 3 substrates (tilted by 0º–3º around [001] NdGaO 3 from (110) plane toward (010) plane) by pulsed laser deposition. The surface of the films is smooth, the signs of step-flow growth mode can be detected for small tilt angles

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Bibliographische Detailangaben
Veröffentlicht in:	Applied physics. A, Materials science & processing Materials science & processing, 2022-05, Vol.128 (5), Article 425
Hauptverfasser:	Mozhaev, Peter B., Khoryushin, Alexey V., Hansen, Jørn Bindslev, Jacobsen, Claus S.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied physics Attitude (inclination) Characterization and Evaluation of Materials Condensed Matter Physics Film thickness Lattice parameters Machines Manufacturing Materials science Nanotechnology Optical and Electronic Materials Physics Physics and Astronomy Processes Pulsed laser deposition Pulsed lasers Substrates Surfaces and Interfaces Thin Films Yttria-stabilized zirconia Yttrium oxide Zirconium dioxide
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Beschreibung
Zusammenfassung:	Thin films of Y:ZrO 2 (YSZ) have been grown on vicinal NdGaO 3 substrates (tilted by 0º–3º around [001] NdGaO 3 from (110) plane toward (010) plane) by pulsed laser deposition. The surface of the films is smooth, the signs of step-flow growth mode can be detected for small tilt angles
ISSN:	0947-8396 1432-0630
DOI:	10.1007/s00339-022-05567-0