Effect of oxygen mixing percentage on structural, optical and electrical properties of ZnTiO3 thin films grown by RF magnetron sputtering

Perovskites are important composites in the area of multidisciplinary applications. The enhancement in properties of the composite can be achieved by carefully choosing and tuning the properties of the thin film at the deposition. In this paper, ZnTiO 3 thin films were deposited on quartz and N-Si substrates at various oxygen mixing percentages (OMP) from 0 to 100% using RF magnetron sputtering technique. The deposited thin films were annealed at 600 °C for 1h and confirmed the cubic perovskite structure of ZnTiO 3 . The roughness value of the thin film is (0.25–0.74 nm)