Coarse‐grained approach to amorphous and anisotropic materials in kinetic Monte Carlo thin‐film growth simulations: A case study of TiO2 and ZnO by plasma‐enhanced chemical vapor deposition

The growth of TiO2 and ZnO thin films is studied by means of coarse‐grained kinetic Monte Carlo simulations under conditions typically encountered in plasma‐enhanced chemical vapor deposition experiments. The basis of our approach is known to work well to simulate the growth of amorphous materials u...

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Veröffentlicht in:	Plasma processes and polymers 2022-03, Vol.19 (3), p.n/a
Hauptverfasser:	Budagosky, Jorge, García‐Casas, Xabier, Sánchez‐Valencia, Juan R., Barranco, Ángel, Borrás, Ana
Format:	Artikel
Sprache:	eng
Schlagworte:	amorphous Amorphous materials anisotropy Atomic force microscopy Chemical vapor deposition Film growth kinetic Monte Carlo (KMC) Microscopy plasma‐enhanced chemical vapor deposition (PE‐CVD) polycrystalline Simulation Texture texturization Thin films TiO2 Titanium dioxide Zinc oxide ZnO
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