Coarse‐grained approach to amorphous and anisotropic materials in kinetic Monte Carlo thin‐film growth simulations: A case study of TiO2 and ZnO by plasma‐enhanced chemical vapor deposition

The growth of TiO2 and ZnO thin films is studied by means of coarse‐grained kinetic Monte Carlo simulations under conditions typically encountered in plasma‐enhanced chemical vapor deposition experiments. The basis of our approach is known to work well to simulate the growth of amorphous materials using cubic grids and is extended here to reproduce not only the morphological characteristics and scaling properties of amorphous TiO2 but also the growth of polycrystalline ZnO with a good approximation, including the evolution of the film texture during growth and its dependence on experimental conditions. The results of the simulations have been compared with available experimental data obtained by X‐ray diffraction, analysis of the texture coefficients, atomic force microscopy, and scanning electron microscopy. Two examples of the results obtained with the model developed in this study: on the left, thin films of amorphous TiO2 (simulations and experiment). On the right, simulated thin films of polycrystalline wurtzite‐type ZnO.