Dielectric Coating Deposition Regimes during Electron-Beam Evaporation of Ceramics in the Fore-Vacuum Pressure Range

We present experimental results on the deposition of dielectric coatings on metal surfaces by electron-beam evaporation of alumina ceramics in nitrogen and oxygen gas medium at the pressures of 5–30 Pa. The feasibility of implementing this approach is associated with the use of unique fore-vacuum plasma electron sources. The effect of electron beam power on the rates of ceramic target evaporation and, consequently, on the coating deposition rate is investigated. The structure, electrical-insulating and mechanical (wear resistance, adhesion) properties of the deposited coatings is investigated. We also show the possibility of using coatings for electrical insulating of wires and monolithic integrated circuits.