Effect of Plasma Control Parameters on the Growth of Nitrogen-Doped Nanocone-Vertical Graphene Hybrid: Theoretical Investigations

A theoretical model on the growth of nitrogen-doped nanocone-vertical graphene hybrid (N-NCN-VG) is developed. The model contains the plasma sheath equations, which are solved via boundary conditions. Using the plasma sheath equations variation of ion number density, ion energy correlated with potential distribution with distance into the plasma sheath is explored. The model is combined with the growth of N-NCN-VG, in C 2 H 2 /NH 3 plasma to examine the effect of plasma control parameters i.e., total gas pressure (250 mTorr–5 Torr) and input plasma power (300–700 W) on the kinetics of plasma species (neutrals, positive ions, and electrons) and the growth attributes like height, thickness and number density of carbon of the N-NCN-VG hybrid. In addition, the model interprets the growth of VG sheet due to defect formation on nanocone. From our theoretical investigations, it is found that as the total gas pressure increases and input plasma power decreases the height of the nanocone, graphene sheet increases along with an increase in carbon number density on the nanocone surface. In addition, the field enhancement factor of the N-NCNVG hybrid decreases with an increase in input power. The obtained results are in good agreement with the existing experimental observations.