The Mechanical Properties of TiN Films Grown by a Pure N2 Plasma Sputtering

Titanium nitride (TIN) films were prepared by using rf magnetron sputtering technique. The films were deposited by a pure N2 plasma sputtering. Their mechanical properties, such as nanoindentation hardness, friction coefficient, and wettability have been investigated. XRD studies revealed that the orientation of TiN films changes toward the (111) orientation with decreasing working pressure due to a strong compressive stress during deposition . The strongest TiN(111) orientation is found when the film is deposited at working pressure of 1pa. This film shows a largest hardness of 15 GPa and a smallest friction coefficient of 0.17. This film was also found to be accompanied by a water-repellent surface with a water contact angle more than 100°