Recent Advances in Materials Design Using Atomic Layer Deposition for Energy Applications

The design and development of materials at the nanoscale has enabled efficient, cutting‐edge renewable energy storage, and conversion devices such as solar cells, water splitting, fuel cells, batteries, and supercapacitors. In addition to creating new materials, the ability to refine the structure and interface properties holds the key to achieving superior performance and durability of these devices. Atomic layer deposition (ALD) has become an important tool for nanofabrication as it allows the deposition of pin‐hole‐free films with atomic‐level thickness and composition control over high aspect ratio surfaces. ALD is successfully used to fabricate devices for renewable energy storage and conversion, for example, to deposit absorber materials, passivation layers, selective contacts, catalyst films, protection barriers, etc. In this review article, recent advances enabled by ALD in designing materials for high‐performance solar cells, catalytic energy conversion systems, batteries, and fuel cells, are summarized. The critical issues impeding the performance and durability of these devices are introduced and then the role of ALD in addressing them is discussed. Finally, the challenges in the implementation of ALD technique for nanofabrication on industrial scale are highlighted and a perspective on potential solutions is provided. Atomic layer deposition (ALD) is widely used in devices for energy capture, storage, and utilization to deposit absorber materials, passivation layers, selective contacts, catalyst films, protection barriers, just to name a few. In this article, recent advances enabled by ALD in designing materials for high performance solar cells, catalytic energy conversion systems, batteries, and fuel cells are reviewed.