Impact of thermal annealing on deep levels in nitrogen-implanted β-Ga2O3 Schottky barrier diodes

Understanding the properties of N-implanted β-Ga2O3 is fundamental for the optimization of doping and isolation structures based on gallium oxide. This paper reports an extensive analysis of the impact of thermal annealing on the concentration and properties of deep levels in N-implanted β-Ga2O3 Schottky barrier diodes by means of capacitance isothermal transient spectroscopy. Samples with annealing temperatures from 800 to 1200 °C were considered. The original results presented in this paper demonstrate the following: (a) The instability of current–voltage characteristics detected for all the samples under test can be attributed to the presence of three electron traps with activation energies of 0.6, 0.7, and 1 eV, consistent with previous reports in β-Ga2O3. (b) The detected traps are not the nitrogen level but intrinsic defects whose concentration is increased by the implantation process. (c) The concentration of deep levels decreases as the annealing temperature increases, demonstrating that the annealing process can effectively restore the quality of the material while keeping the conductivity decrease related to the presence of the nitrogen. Finally, (d) we demonstrate that the residual leakage and the turn-on voltage shift are correlated with the Arrhenius signature of the detected deep levels. An interpretation is proposed to explain the measurement results.