Structure and Properties of CrAlSiC Films Deposited by the Vacuum-Plasma Technique under Various Conditions

CrAlSiC films deposited under various conditions of carbon-plasma generation (PVD or PACVD) are investigated. A plasma source of cathodic-arc discharge with a Cr–Al–Si cathode and a source of pulsed cathodic-arc discharge with a graphite cathode are used for the deposition of a CrAlSiC(I) film. A plasma source of cathodic-arc discharge with a Cr–Al–Si cathode and a gas-discharge device for generating a non-self-sustaining discharge in an argon-acetylene mixture are applied for the deposition of a CrAlSiC(II) film. The sources work together in both processes. The film structure is investigated using electron microscopy and Raman spectroscopy. The hardness and elasticity modulus are determined by nanoindentation; the friction coefficient is tested with the reciprocating motion of a steel ball without lubrication. It is found that the condition of generating carbon plasma (graphite sputtering or destruction of acetylene) has a significant effect on the structure and properties of CrAlSiC. CrAlSiC(I) consists of an amorphous phase with inclusions of silicon-carbide nanograins 10–30 nm in size. On the surface there are protrusions with a size of 2–4 µm. These features provide a high hardness and low friction coefficient. No crystalline formations are found in the amorphous matrix of CrAlSiC(II). On the surface there are bubble-like formations up to 15 microns in size. This coating is inferior to CrAlSiC(I) in terms of hardness and resistance to friction. Under friction the film is destroyed by chipping fragments. CrAlSiC(I) can be recommended for practical application.