Porous single-crystal diamond

Porous diamonds have unique application prospects due to their flexible surface functionalities, high surface-area-to-volume ratio and high self-sharpening ability. Porous diamonds are usually prepared through microwave plasma chemical vapor deposition (MPCVD) techniques or through etching by transition metals, which are expensive and inefficient. Here, we report a simple and efficient method to grow large millimetre-scale porous single-crystal diamonds using high-pressure and high-temperature (HP-HT) techniques. The porous diamond crystal growth is driven by minimizing the surface energy through the attachment of small crystals to a large seed crystal surface in a metal solvent. Industrial-scale production of single-crystal porous diamonds is possible with this discovery. The porous single-crystal diamond is prepared by using high pressure and high temperature (HP-HT) technology. XRD, SEM, Raman spectroscopy and HRTEM observations illustrated the high quality of the porous diamond surface layer and confirmed the obtained diamonds as porous single crystals. [Display omitted]