Development of incident x-ray flux monitor for coherent x-ray diffraction microscopy

An incident x-ray flux monitor for coherent x-ray diffraction microscopy was developed. The intensities of x-rays passing through the sample were measured using an x-ray photodiode, with the simultaneous measurement of the x-ray diffraction intensities of the sample. As a result of the normalization of the x-ray diffraction intensities by the incident x-ray flux determined from the monitor, the fluctuation of the speckle intensities was successfully suppressed.