In situ monitoring of plasma etch processes with a quantum cascade laser arrangement in semiconductor industrial environment

Concentrations of the etch product SiF4 were measured online and in situ in technological etch plasmas with an especially designed quantum cascade laser arrangement for application in semiconductor industrial environment, the Q-MACS Etch. The combination of quantum cascade lasers and infra red absor...

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Veröffentlicht in:	Journal of physics. Conference series 2009-03, Vol.157 (1), p.012007
Hauptverfasser:	Lang, N, Röpcke, J, Zimmermann, H, Steinbach, A, Wege, S
Format:	Artikel
Sprache:	eng
Schlagworte:	Monitoring Physics Plasmas (physics) Quantum cascade lasers
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