Growth of magnetic cobalt/chromium nano-arrays by atom-optical lithography

Growth of magnetic cobalt/chromium nano-arrays by atom-optical lithography

Arrays of magnetic cobalt/chromium (Co-Cr) nanolines are grown by depositing an atomic beam of Co-Cr alloy through a laser standing wave (SW) at λ/2 212.8 nm onto a substrate. During deposition, only the chromium atoms are resonantly affected by the optical potential created by the SW, causing a per...

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Veröffentlicht in:Journal of physics. Conference series 2011-07, Vol.303 (1), p.012046-6
Hauptverfasser: Atoneche, F, Malik, D, Kirilyuk, A, Toonen, A J, Etteger, A F van, Rasing, Th
Format: Artikel
Sprache:eng
Schlagworte:
Arrays
Atomic beams
Chromium
Cobalt base alloys
Deposition
Kerr magnetooptical effect
Lithography
Magnetic fields
Magnetic properties
Magnetic structure
Microscopy
Modulation
Nanostructure
Optical properties
Physics
Standing waves
Substrates
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Zusammenfassung:Arrays of magnetic cobalt/chromium (Co-Cr) nanolines are grown by depositing an atomic beam of Co-Cr alloy through a laser standing wave (SW) at λ/2 212.8 nm onto a substrate. During deposition, only the chromium atoms are resonantly affected by the optical potential created by the SW, causing a periodic modulation of the chromium concentration and consequently of the magnetic properties. Magnetic force microscopy and magneto-optical Kerr effect studies reveal a patterned magnetic structure on the substrate surface.
ISSN:1742-6596
1742-6588
1742-6596
DOI:10.1088/1742-6596/303/1/012046