Structural and electronic properties of anatase Ti1−xFexO2−δ thin film prepared by RF magnetron sputtering

Ti1-xFexO2-δ thin films have been deposited on Nb-doped SrTiO3 substrate by RF magnetron sputtering. The as-deposited thin films prepared at Tsub 300 ~ 500°C exhibit anatase structure. The lattice constant depends on the crystallization temperature. The substitution of Fe ions is confirmed by photoemission spectra. The Ti 2p X-ray absorption spectra exhibit that Ti 3d-band occupancy is increased as a result of the oxygen vacancies. The thin film prepared at 500°C has the Ti 3d -DOS at the Fermi level. These findings indicate that Ti 3d electrons created by the oxygen vacancies contribute to the electrical conductivity.