Modelling of hot target reactive sputtering

Modelling of hot target reactive sputtering

The main foundations of the physicochemical models for reactive magnetron sputtering of a hot metal target in a nitrogen environment are described. The system of equations describing the model is solved for the titanium sputtering in a nitrogen environment. It is established that the width of the hy...

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Veröffentlicht in:Journal of physics. Conference series 2017-05, Vol.857 (1), p.12039
Hauptverfasser: Shapovalov, V I, Smirnov, V V
Format: Artikel
Sprache:eng
Schlagworte:
Hysteresis loops
Magnetron sputtering
Physics
Titanium
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Zusammenfassung:The main foundations of the physicochemical models for reactive magnetron sputtering of a hot metal target in a nitrogen environment are described. The system of equations describing the model is solved for the titanium sputtering in a nitrogen environment. It is established that the width of the hysteresis loop decreases down to zero with an increase of the discharge current density.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/857/1/012039