Reactive magnetron sputtering of hot titanium target in mixture of argon and nitrogen

The influence of nitrogen flow rate on the discharge I-V characteristics of a dc magnetron with a single hot titanium target is studied. The basic processes forming the discharge are determined. The discharge physical models are proposed.

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Bibliographische Detailangaben
Veröffentlicht in:	Journal of physics. Conference series 2019-07, Vol.1281 (1), p.12071
Hauptverfasser:	Shapovalov, V I, Minzhulina, E A, Shestakov, D S, Kochin, A V
Format:	Artikel
Sprache:	eng
Schlagworte:	Argon Current voltage characteristics Discharge Flow velocity Magnetron sputtering Physics Titanium
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	The influence of nitrogen flow rate on the discharge I-V characteristics of a dc magnetron with a single hot titanium target is studied. The basic processes forming the discharge are determined. The discharge physical models are proposed.
ISSN:	1742-6588 1742-6596
DOI:	10.1088/1742-6596/1281/1/012071