Spatial confinement of the optical Tamm states under patterned metal films

Optical Tamm states are defect electromagnetic modes which appear at the discontinuity of the optical crystal. Being trapped at the interface of a dielectric Bragg mirror and a metal they demonstrate a tight localization in the direction perpendicular to the interface. Here we study the trapping of the Tamm states in the interface plane by patterning of the metal layer. In particular, we propose a method of metal film deposition based on a electro-induced lithography which possesses a nanometer lateral resolution.