Determination of heat fluxes and surface temperatures during magnetron sputtering with a cold and hot target

The method of calculation of heat fluxes and surface temperatures during magnetron sputtering of cold and hot targets developed from using the algebraic method for calculating radiant fluxes is presented, which allows to predict the required power characteristics for obtaining the desired temperature on the target and the substrate. Comparison of the experimental data and the demonstrated results of the calculations testify to the possibility of applying this technique. The temperature on the substrate can be controlled by changing the distance between the substrate and the target within certain limits, and the value of the distance can be estimated using the suggested calculation model.