Obtaining of non-stoichiometric titanium oxide using reactive magnetron sputtering

Obtaining of non-stoichiometric titanium oxide using reactive magnetron sputtering

A mode of obtaining of non-stoichiometric titanium oxide film in magnetron system with turbomolecular pump of low performance was found. The mode provides significantly lower volumetric flow rate of argon and reactive gas comparing with known mode. Dependencies of discharge voltage and film sputteri...

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Veröffentlicht in:IOP conference series. Materials Science and Engineering 2018-07, Vol.387 (1), p.12080
Hauptverfasser: Udovichenko, S Y, Bobylev, A N, Belotserkovtseva, D A, Shpindyuk, D D
Format: Artikel
Sprache:eng
Schlagworte:
Argon
Flow velocity
Magnetron sputtering
Oxide coatings
Stoichiometry
Titanium oxides
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Zusammenfassung:A mode of obtaining of non-stoichiometric titanium oxide film in magnetron system with turbomolecular pump of low performance was found. The mode provides significantly lower volumetric flow rate of argon and reactive gas comparing with known mode. Dependencies of discharge voltage and film sputtering rate on reactive gas volumetric flow were investigated. Measurements of film obtained by the mode with low oxygen volumetric flow proved deviation of composition stoichiometry.
ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/387/1/012080