Development of micro-Laue technique at Shanghai Synchrotron Radiation Facility for materials sciences
Synchrotron radiation-based micro-Laue technique has showcased great application potentials in materials science study for its unprecedented crystal orientation and lattice strain/stress resolution. Here we report the updated progress in the development of the micro-Laue technique on the X-ray test...
Gespeichert in:
Veröffentlicht in: | Science China materials 2021-09, Vol.64 (9), p.2348-2358 |
---|---|
Hauptverfasser: | , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Synchrotron radiation-based micro-Laue technique has showcased great application potentials in materials science study for its unprecedented crystal orientation and lattice strain/stress resolution. Here we report the updated progress in the development of the micro-Laue technique on the X-ray test beamline at Shanghai Synchrotron Radiation Facility. So far, 40 µm (h) × 50 µm (v) X-ray beam spot is routinely obtained, with the convergent angle of 0.2 mrad (h) × 0.12 mrad (v). Area scans are conducted on a GH3535 Ni-based superalloy base metal and weld joint with the same chemical composition. By analyzing the tremendous amount of Laue diffraction patterns using in-house developed software packages, the crystal orientation, elastic strain, and defect distributions are mapped and investigated. Such a successful proof-of-principle study offers first-hand experience on the further optimization of the design and construction of the scanning micro-Laue facility on the superbend beamline with improved spatial resolution and multiple functions for simultaneous chemical fluorescence mapping and
in-situ
microstructural evolution studies. The micro-Laue diffraction beamline at Shanghai Synchrotron Radiation Facility will provide a versatile and powerful tool for the orientation and strain/stress mapping combined with phase identification with micron-sized spatial resolution. |
---|---|
ISSN: | 2095-8226 2199-4501 |
DOI: | 10.1007/s40843-021-1648-3 |