Preparation of Orthorhombic WO3 Thin Films and Their Crystal Quality-Dependent Dye Photodegradation Ability

Direct current (DC) magnetron sputtering deposited WO3 films with different crystalline qualities were synthesized by postannealing at various temperatures. The in-situ DC sputtering deposited WO3 thin film at 375 °C exhibited an amorphous structure. The as-grown WO3 films were crystallized after annealing at temperatures of 400–600 °C in ambient air. Structural analyses revealed that the crystalline WO3 films have an orthorhombic structure. Moreover, the crystallite size of the WO3 film exhibited an explosive coarsening behavior at an annealing temperature above 600 °C. The density of oxygen vacancy of the WO3 films was substantially lowered through a high temperature annealing procedure. The optical bandgap values of the WO3 films are highly associated with the degree of crystalline quality. The annealing-induced variation of microstructures, crystallinity, and bandgap of the amorphous WO3 thin films explained the various photoactivated properties of the films in this study.