Simulation of 2D Interference Pattern Structure for Rectangular and Circular Slits Using Dual Beam Interference Technique

Simulation of 2D Interference Pattern Structure for Rectangular and Circular Slits Using Dual Beam Interference Technique

Laser interference lithography (LIL) is known to be based completely on the dual‐beam interference (DBI) technique. In this present work, a 2D interference pattern structure for rectangular and circular slits is simulated. The proposed 2D pattern structure is optimized by varying the slit width and...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Macromolecular symposia. 2021-06, Vol.397 (1), p.n/a
Hauptverfasser: Pandey, Girijesh Narayan, Shukla, Anil Kumar, Thapa, Khem B., Singh, Munendra, Singh, Ram Chandra
Format: Artikel
Sprache:eng
Schlagworte:
Diffraction patterns
dual‐beam interference (DBI)
Interference
laser interference lithography (LIL)
MATLAB
Separation
Slits
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page n/a
container_issue 1
container_start_page
container_title Macromolecular symposia.
container_volume 397
creator Pandey, Girijesh Narayan
Shukla, Anil Kumar
Thapa, Khem B.
Singh, Munendra
Singh, Ram Chandra
description Laser interference lithography (LIL) is known to be based completely on the dual‐beam interference (DBI) technique. In this present work, a 2D interference pattern structure for rectangular and circular slits is simulated. The proposed 2D pattern structure is optimized by varying the slit width and slit separation. Several fringe patterns following the varying slit width and slit separation are reported.
doi_str_mv 10.1002/masy.202100001
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2541863381</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2541863381</sourcerecordid><originalsourceid>FETCH-LOGICAL-c2841-e469a9c17dd805f92985660a1f7d8c5327130d6ec06d0fab5d5821e6e67e7b193</originalsourceid><addsrcrecordid>eNqFkM9LwzAcxYMoOKdXzwHPnUm6ps1xbv4YTBS7HTyVLP1mZrTpTFqk_72ZE8WTp-_3wee9Bw-hS0pGlBB2XUvfjxhhQRBCj9CAJoxGsSDkOPyEsYjGnJyiM--3gRAipQPU56buKtmaxuJGYzbDc9uC0-DAKsDPsg3K4rx1nWo7B1g3Dr-AaqXdBJ_D0pZ4apz6EnllWo9X3tgNnnWywjcg67-JS1Bv1rx3cI5OtKw8XHzfIVrd3S6nD9Hi6X4-nSwixbIxjWDMhRSKpmWZkUQLJrKEcyKpTstMJTFLaUxKDorwkmi5TsokYxQ48BTSNRXxEF0dcneuCbW-LbZN52yoLFgyphmP44wGanSglGu8d6CLnTO1dH1BSbGft9jPW_zMGwziYPgwFfT_0MXjJH_99X4CfOB_Vg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2541863381</pqid></control><display><type>article</type><title>Simulation of 2D Interference Pattern Structure for Rectangular and Circular Slits Using Dual Beam Interference Technique</title><source>Wiley Online Library Journals Frontfile Complete</source><creator>Pandey, Girijesh Narayan ; Shukla, Anil Kumar ; Thapa, Khem B. ; Singh, Munendra ; Singh, Ram Chandra</creator><creatorcontrib>Pandey, Girijesh Narayan ; Shukla, Anil Kumar ; Thapa, Khem B. ; Singh, Munendra ; Singh, Ram Chandra</creatorcontrib><description>Laser interference lithography (LIL) is known to be based completely on the dual‐beam interference (DBI) technique. In this present work, a 2D interference pattern structure for rectangular and circular slits is simulated. The proposed 2D pattern structure is optimized by varying the slit width and slit separation. Several fringe patterns following the varying slit width and slit separation are reported.</description><identifier>ISSN: 1022-1360</identifier><identifier>EISSN: 1521-3900</identifier><identifier>DOI: 10.1002/masy.202100001</identifier><language>eng</language><publisher>Weinheim: Wiley Subscription Services, Inc</publisher><subject>Diffraction patterns ; dual‐beam interference (DBI) ; Interference ; laser interference lithography (LIL) ; MATLAB ; Separation ; Slits</subject><ispartof>Macromolecular symposia., 2021-06, Vol.397 (1), p.n/a</ispartof><rights>2021 Wiley‐VCH GmbH</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c2841-e469a9c17dd805f92985660a1f7d8c5327130d6ec06d0fab5d5821e6e67e7b193</citedby><cites>FETCH-LOGICAL-c2841-e469a9c17dd805f92985660a1f7d8c5327130d6ec06d0fab5d5821e6e67e7b193</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fmasy.202100001$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fmasy.202100001$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,778,782,1414,27907,27908,45557,45558</link.rule.ids></links><search><creatorcontrib>Pandey, Girijesh Narayan</creatorcontrib><creatorcontrib>Shukla, Anil Kumar</creatorcontrib><creatorcontrib>Thapa, Khem B.</creatorcontrib><creatorcontrib>Singh, Munendra</creatorcontrib><creatorcontrib>Singh, Ram Chandra</creatorcontrib><title>Simulation of 2D Interference Pattern Structure for Rectangular and Circular Slits Using Dual Beam Interference Technique</title><title>Macromolecular symposia.</title><description>Laser interference lithography (LIL) is known to be based completely on the dual‐beam interference (DBI) technique. In this present work, a 2D interference pattern structure for rectangular and circular slits is simulated. The proposed 2D pattern structure is optimized by varying the slit width and slit separation. Several fringe patterns following the varying slit width and slit separation are reported.</description><subject>Diffraction patterns</subject><subject>dual‐beam interference (DBI)</subject><subject>Interference</subject><subject>laser interference lithography (LIL)</subject><subject>MATLAB</subject><subject>Separation</subject><subject>Slits</subject><issn>1022-1360</issn><issn>1521-3900</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNqFkM9LwzAcxYMoOKdXzwHPnUm6ps1xbv4YTBS7HTyVLP1mZrTpTFqk_72ZE8WTp-_3wee9Bw-hS0pGlBB2XUvfjxhhQRBCj9CAJoxGsSDkOPyEsYjGnJyiM--3gRAipQPU56buKtmaxuJGYzbDc9uC0-DAKsDPsg3K4rx1nWo7B1g3Dr-AaqXdBJ_D0pZ4apz6EnllWo9X3tgNnnWywjcg67-JS1Bv1rx3cI5OtKw8XHzfIVrd3S6nD9Hi6X4-nSwixbIxjWDMhRSKpmWZkUQLJrKEcyKpTstMJTFLaUxKDorwkmi5TsokYxQ48BTSNRXxEF0dcneuCbW-LbZN52yoLFgyphmP44wGanSglGu8d6CLnTO1dH1BSbGft9jPW_zMGwziYPgwFfT_0MXjJH_99X4CfOB_Vg</recordid><startdate>202106</startdate><enddate>202106</enddate><creator>Pandey, Girijesh Narayan</creator><creator>Shukla, Anil Kumar</creator><creator>Thapa, Khem B.</creator><creator>Singh, Munendra</creator><creator>Singh, Ram Chandra</creator><general>Wiley Subscription Services, Inc</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>202106</creationdate><title>Simulation of 2D Interference Pattern Structure for Rectangular and Circular Slits Using Dual Beam Interference Technique</title><author>Pandey, Girijesh Narayan ; Shukla, Anil Kumar ; Thapa, Khem B. ; Singh, Munendra ; Singh, Ram Chandra</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2841-e469a9c17dd805f92985660a1f7d8c5327130d6ec06d0fab5d5821e6e67e7b193</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Diffraction patterns</topic><topic>dual‐beam interference (DBI)</topic><topic>Interference</topic><topic>laser interference lithography (LIL)</topic><topic>MATLAB</topic><topic>Separation</topic><topic>Slits</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Pandey, Girijesh Narayan</creatorcontrib><creatorcontrib>Shukla, Anil Kumar</creatorcontrib><creatorcontrib>Thapa, Khem B.</creatorcontrib><creatorcontrib>Singh, Munendra</creatorcontrib><creatorcontrib>Singh, Ram Chandra</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Macromolecular symposia.</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Pandey, Girijesh Narayan</au><au>Shukla, Anil Kumar</au><au>Thapa, Khem B.</au><au>Singh, Munendra</au><au>Singh, Ram Chandra</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Simulation of 2D Interference Pattern Structure for Rectangular and Circular Slits Using Dual Beam Interference Technique</atitle><jtitle>Macromolecular symposia.</jtitle><date>2021-06</date><risdate>2021</risdate><volume>397</volume><issue>1</issue><epage>n/a</epage><issn>1022-1360</issn><eissn>1521-3900</eissn><abstract>Laser interference lithography (LIL) is known to be based completely on the dual‐beam interference (DBI) technique. In this present work, a 2D interference pattern structure for rectangular and circular slits is simulated. The proposed 2D pattern structure is optimized by varying the slit width and slit separation. Several fringe patterns following the varying slit width and slit separation are reported.</abstract><cop>Weinheim</cop><pub>Wiley Subscription Services, Inc</pub><doi>10.1002/masy.202100001</doi><tpages>4</tpages></addata></record>
fulltext fulltext
identifier ISSN: 1022-1360
ispartof Macromolecular symposia., 2021-06, Vol.397 (1), p.n/a
issn 1022-1360
1521-3900
language eng
recordid cdi_proquest_journals_2541863381
source Wiley Online Library Journals Frontfile Complete
subjects Diffraction patterns
dual‐beam interference (DBI)
Interference
laser interference lithography (LIL)
MATLAB
Separation
Slits
title Simulation of 2D Interference Pattern Structure for Rectangular and Circular Slits Using Dual Beam Interference Technique
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T07%3A03%3A24IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Simulation%20of%202D%20Interference%20Pattern%20Structure%20for%20Rectangular%20and%20Circular%20Slits%20Using%20Dual%20Beam%20Interference%20Technique&rft.jtitle=Macromolecular%20symposia.&rft.au=Pandey,%20Girijesh%20Narayan&rft.date=2021-06&rft.volume=397&rft.issue=1&rft.epage=n/a&rft.issn=1022-1360&rft.eissn=1521-3900&rft_id=info:doi/10.1002/masy.202100001&rft_dat=%3Cproquest_cross%3E2541863381%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2541863381&rft_id=info:pmid/&rfr_iscdi=true