Simulation of 2D Interference Pattern Structure for Rectangular and Circular Slits Using Dual Beam Interference Technique

Laser interference lithography (LIL) is known to be based completely on the dual‐beam interference (DBI) technique. In this present work, a 2D interference pattern structure for rectangular and circular slits is simulated. The proposed 2D pattern structure is optimized by varying the slit width and...

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Veröffentlicht in:	Macromolecular symposia. 2021-06, Vol.397 (1), p.n/a
Hauptverfasser:	Pandey, Girijesh Narayan, Shukla, Anil Kumar, Thapa, Khem B., Singh, Munendra, Singh, Ram Chandra
Format:	Artikel
Sprache:	eng
Schlagworte:	Diffraction patterns dual‐beam interference (DBI) Interference laser interference lithography (LIL) MATLAB Separation Slits
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	Laser interference lithography (LIL) is known to be based completely on the dual‐beam interference (DBI) technique. In this present work, a 2D interference pattern structure for rectangular and circular slits is simulated. The proposed 2D pattern structure is optimized by varying the slit width and slit separation. Several fringe patterns following the varying slit width and slit separation are reported.
ISSN:	1022-1360 1521-3900
DOI:	10.1002/masy.202100001