Effect of Oxygen Ion Implantation on Physicochemical Structure and Corrosion-Electrochemical Behavior of Copper–Manganese Alloy

The chemical composition and structure of the Cu–Mn alloy after modification with oxygen ions with an energy of 10–30 keV and a dose of 10 17 cm –2 have been investigated. Changes in the type of chemical bonding and atomic structure in irradiated Cu–Mn samples have been studied by X-ray photoelectro...

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Veröffentlicht in:	Inorganic materials : applied research 2021-05, Vol.12 (3), p.581-587
Hauptverfasser:	Vorobiev, V. L., Bakieva, O. R., Gilmutdinov, F. Z., Kolotov, A. A., Averkiev, I. K., Borisova, E. M., Reshetnikov, S. M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Anodic polarization Atomic structure Buffer solutions Chemical bonds Chemical composition Chemistry Chemistry and Materials Science Copper base alloys Corrosion effects Effects of Energy Fluxes on Materials Electrochemical analysis Electrode polarization Hydrochloric acid Industrial Chemistry/Chemical Engineering Inorganic Chemistry Ion implantation Manganese Materials Science Oxygen ions Photoelectrons Potassium hydroxides
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Zusammenfassung:	The chemical composition and structure of the Cu–Mn alloy after modification with oxygen ions with an energy of 10–30 keV and a dose of 10 17 cm –2 have been investigated. Changes in the type of chemical bonding and atomic structure in irradiated Cu–Mn samples have been studied by X-ray photoelectron spectroscopy and X-ray diffraction. Electrochemical studies of ion-modified surfaces have been performed by measuring the anodic potentiodynamic polarization curves in a neutral borate buffer solution, hydrochloric acid, and potassium hydroxide.
ISSN:	2075-1133 2075-115X
DOI:	10.1134/S2075113321030394