Enhancement of metal adhesion, owing to the plasma texturing of PEEK
To understand both chemical and anchoring aspects of Al adhesion, the poly‐ether‐ether‐ketone (PEEK) surface was plasma‐textured before being coated. The practical adhesion was compared with that obtained by laser texturing. The surfaces and assemblies were characterized by scanning electron microsc...
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creator | Gravis, David Rigolé, Grégoire Yengui, Mayssa Knapp, Wolfgang Coulon, Jean‐François Poncin‐Epaillard, Fabienne |
description | To understand both chemical and anchoring aspects of Al adhesion, the poly‐ether‐ether‐ketone (PEEK) surface was plasma‐textured before being coated. The practical adhesion was compared with that obtained by laser texturing. The surfaces and assemblies were characterized by scanning electron microscopy, atomic force microscopy, surface free energy determination, and pull‐off tests. Patterning processes increase Al adhesion. O2 plasma appears to be the most efficient through a texture assigned to the chemical erosion, whereas Ar plasma mostly induces material etching with thermal effects altering the PEEK crystallinity. With low‐pressure plasmas, this texturing can be added to the chemical functionalization to further increase the adhesion.
This paper deals with the dependence of metal–polymer assembly on mechanical anchoring. The influence of electron cyclotron resonance (ECR), atmospheric‐pressure plasmas, and laser texturing on Al adhesion on poly‐ether‐ether‐ketone was demonstrated. It appears that the O2 ECR plasma is the most efficient for texturing and chemical functionalization. |
doi_str_mv | 10.1002/ppap.202100009 |
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This paper deals with the dependence of metal–polymer assembly on mechanical anchoring. The influence of electron cyclotron resonance (ECR), atmospheric‐pressure plasmas, and laser texturing on Al adhesion on poly‐ether‐ether‐ketone was demonstrated. It appears that the O2 ECR plasma is the most efficient for texturing and chemical functionalization.</description><identifier>ISSN: 1612-8850</identifier><identifier>EISSN: 1612-8869</identifier><identifier>DOI: 10.1002/ppap.202100009</identifier><language>eng</language><publisher>Weinheim: Wiley Subscription Services, Inc</publisher><subject>Adhesion ; aluminum–PEEK assembly ; Atomic force microscopy ; Free energy ; laser ; Laser beam texturing ; Microscopy ; Plasma ; Plasmas ; Polyether ether ketones ; Temperature effects ; Texturing</subject><ispartof>Plasma processes and polymers, 2021-06, Vol.18 (6), p.n/a</ispartof><rights>2021 Wiley‐VCH GmbH</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3549-708e4833617b10673cf1ae10b3af58166c82ec1715d96387e8eaab74109ba7803</citedby><cites>FETCH-LOGICAL-c3549-708e4833617b10673cf1ae10b3af58166c82ec1715d96387e8eaab74109ba7803</cites><orcidid>0000-0001-5264-1203 ; 0000-0001-5537-0701</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fppap.202100009$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fppap.202100009$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1417,27923,27924,45573,45574</link.rule.ids></links><search><creatorcontrib>Gravis, David</creatorcontrib><creatorcontrib>Rigolé, Grégoire</creatorcontrib><creatorcontrib>Yengui, Mayssa</creatorcontrib><creatorcontrib>Knapp, Wolfgang</creatorcontrib><creatorcontrib>Coulon, Jean‐François</creatorcontrib><creatorcontrib>Poncin‐Epaillard, Fabienne</creatorcontrib><title>Enhancement of metal adhesion, owing to the plasma texturing of PEEK</title><title>Plasma processes and polymers</title><description>To understand both chemical and anchoring aspects of Al adhesion, the poly‐ether‐ether‐ketone (PEEK) surface was plasma‐textured before being coated. The practical adhesion was compared with that obtained by laser texturing. The surfaces and assemblies were characterized by scanning electron microscopy, atomic force microscopy, surface free energy determination, and pull‐off tests. Patterning processes increase Al adhesion. O2 plasma appears to be the most efficient through a texture assigned to the chemical erosion, whereas Ar plasma mostly induces material etching with thermal effects altering the PEEK crystallinity. With low‐pressure plasmas, this texturing can be added to the chemical functionalization to further increase the adhesion.
This paper deals with the dependence of metal–polymer assembly on mechanical anchoring. The influence of electron cyclotron resonance (ECR), atmospheric‐pressure plasmas, and laser texturing on Al adhesion on poly‐ether‐ether‐ketone was demonstrated. It appears that the O2 ECR plasma is the most efficient for texturing and chemical functionalization.</description><subject>Adhesion</subject><subject>aluminum–PEEK assembly</subject><subject>Atomic force microscopy</subject><subject>Free energy</subject><subject>laser</subject><subject>Laser beam texturing</subject><subject>Microscopy</subject><subject>Plasma</subject><subject>Plasmas</subject><subject>Polyether ether ketones</subject><subject>Temperature effects</subject><subject>Texturing</subject><issn>1612-8850</issn><issn>1612-8869</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNqFkLtPwzAQhy0EEqWwMltiJeVsN36MVUkBUYkMMFtOeqGp8sJOVfrfk6qojEz30O-7kz5CbhlMGAB_6DrXTTjwYQAwZ2TEJOOR1tKcn_oYLslVCBsAAbGGEXlMmrVrcqyx6Wlb0Bp7V1G3WmMo2-aetruy-aR9S_s10q5yoXa0x-9-6w_7AUiT5PWaXBSuCnjzW8fkY5G8z5-j5dvTy3y2jHIRT02kQONUCyGZyhhIJfKCOWSQCVfEmkmZa445UyxeGSm0Qo3OZWrKwGROaRBjcne82_n2a4uht5t265vhpeWxkIpLI82QmhxTuW9D8FjYzpe183vLwB5M2YMpezI1AOYI7MoK9_-kbZrO0j_2B9T9avI</recordid><startdate>202106</startdate><enddate>202106</enddate><creator>Gravis, David</creator><creator>Rigolé, Grégoire</creator><creator>Yengui, Mayssa</creator><creator>Knapp, Wolfgang</creator><creator>Coulon, Jean‐François</creator><creator>Poncin‐Epaillard, Fabienne</creator><general>Wiley Subscription Services, Inc</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope><orcidid>https://orcid.org/0000-0001-5264-1203</orcidid><orcidid>https://orcid.org/0000-0001-5537-0701</orcidid></search><sort><creationdate>202106</creationdate><title>Enhancement of metal adhesion, owing to the plasma texturing of PEEK</title><author>Gravis, David ; Rigolé, Grégoire ; Yengui, Mayssa ; Knapp, Wolfgang ; Coulon, Jean‐François ; Poncin‐Epaillard, Fabienne</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3549-708e4833617b10673cf1ae10b3af58166c82ec1715d96387e8eaab74109ba7803</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Adhesion</topic><topic>aluminum–PEEK assembly</topic><topic>Atomic force microscopy</topic><topic>Free energy</topic><topic>laser</topic><topic>Laser beam texturing</topic><topic>Microscopy</topic><topic>Plasma</topic><topic>Plasmas</topic><topic>Polyether ether ketones</topic><topic>Temperature effects</topic><topic>Texturing</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Gravis, David</creatorcontrib><creatorcontrib>Rigolé, Grégoire</creatorcontrib><creatorcontrib>Yengui, Mayssa</creatorcontrib><creatorcontrib>Knapp, Wolfgang</creatorcontrib><creatorcontrib>Coulon, Jean‐François</creatorcontrib><creatorcontrib>Poncin‐Epaillard, Fabienne</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Plasma processes and polymers</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Gravis, David</au><au>Rigolé, Grégoire</au><au>Yengui, Mayssa</au><au>Knapp, Wolfgang</au><au>Coulon, Jean‐François</au><au>Poncin‐Epaillard, Fabienne</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Enhancement of metal adhesion, owing to the plasma texturing of PEEK</atitle><jtitle>Plasma processes and polymers</jtitle><date>2021-06</date><risdate>2021</risdate><volume>18</volume><issue>6</issue><epage>n/a</epage><issn>1612-8850</issn><eissn>1612-8869</eissn><abstract>To understand both chemical and anchoring aspects of Al adhesion, the poly‐ether‐ether‐ketone (PEEK) surface was plasma‐textured before being coated. The practical adhesion was compared with that obtained by laser texturing. The surfaces and assemblies were characterized by scanning electron microscopy, atomic force microscopy, surface free energy determination, and pull‐off tests. Patterning processes increase Al adhesion. O2 plasma appears to be the most efficient through a texture assigned to the chemical erosion, whereas Ar plasma mostly induces material etching with thermal effects altering the PEEK crystallinity. With low‐pressure plasmas, this texturing can be added to the chemical functionalization to further increase the adhesion.
This paper deals with the dependence of metal–polymer assembly on mechanical anchoring. The influence of electron cyclotron resonance (ECR), atmospheric‐pressure plasmas, and laser texturing on Al adhesion on poly‐ether‐ether‐ketone was demonstrated. It appears that the O2 ECR plasma is the most efficient for texturing and chemical functionalization.</abstract><cop>Weinheim</cop><pub>Wiley Subscription Services, Inc</pub><doi>10.1002/ppap.202100009</doi><tpages>13</tpages><orcidid>https://orcid.org/0000-0001-5264-1203</orcidid><orcidid>https://orcid.org/0000-0001-5537-0701</orcidid></addata></record> |
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subjects | Adhesion aluminum–PEEK assembly Atomic force microscopy Free energy laser Laser beam texturing Microscopy Plasma Plasmas Polyether ether ketones Temperature effects Texturing |
title | Enhancement of metal adhesion, owing to the plasma texturing of PEEK |
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