Enhancement of metal adhesion, owing to the plasma texturing of PEEK

To understand both chemical and anchoring aspects of Al adhesion, the poly‐ether‐ether‐ketone (PEEK) surface was plasma‐textured before being coated. The practical adhesion was compared with that obtained by laser texturing. The surfaces and assemblies were characterized by scanning electron microsc...

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Veröffentlicht in:Plasma processes and polymers 2021-06, Vol.18 (6), p.n/a
Hauptverfasser: Gravis, David, Rigolé, Grégoire, Yengui, Mayssa, Knapp, Wolfgang, Coulon, Jean‐François, Poncin‐Epaillard, Fabienne
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Sprache:eng
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Zusammenfassung:To understand both chemical and anchoring aspects of Al adhesion, the poly‐ether‐ether‐ketone (PEEK) surface was plasma‐textured before being coated. The practical adhesion was compared with that obtained by laser texturing. The surfaces and assemblies were characterized by scanning electron microscopy, atomic force microscopy, surface free energy determination, and pull‐off tests. Patterning processes increase Al adhesion. O2 plasma appears to be the most efficient through a texture assigned to the chemical erosion, whereas Ar plasma mostly induces material etching with thermal effects altering the PEEK crystallinity. With low‐pressure plasmas, this texturing can be added to the chemical functionalization to further increase the adhesion. This paper deals with the dependence of metal–polymer assembly on mechanical anchoring. The influence of electron cyclotron resonance (ECR), atmospheric‐pressure plasmas, and laser texturing on Al adhesion on poly‐ether‐ether‐ketone was demonstrated. It appears that the O2 ECR plasma is the most efficient for texturing and chemical functionalization.
ISSN:1612-8850
1612-8869
DOI:10.1002/ppap.202100009