Diffraction Structures Formed by Two Crossed Superimposed Diffraction Gratings

The diffraction patterns generated by surface relief diffraction structures that consisted of two identical crossed, superimposed gratings formed in the As 2 S 3 thin films by electron beam recording and subsequent chemical etching were studied. The angle between the gratings with grating periods equal to 2 μm was varied between 2° and 90°. Additional diffraction gratings formed by a set of the intersection nodes of the basic grating lines were considered to simulate the diffraction patterns. The circular symmetric diffraction structure composed of four crossed superimposed gratings with equal periods has been considered as a combination of pairs of crossed, superimposed gratings. A good agreement between the calculated and experimental diffraction patterns is observed.