Physical Processes Occurring in Treating a Substrate and Depositing Nanocoatings on It by a Laser–Plasma Method

With the aim to simplify the automation of the process of sputtering nanocoatings by a laser–plasma method in vacuum, it is suggested to obtain an ion flow from a laser plasma and smoothly regulate the energy of ions and the density of their flow with the aid of the electric field potential. In treating the substrate surface by ion streams, the regimes of etching the surface have been determined, as well as creation of a pseudodiffusional layer of the target material in the near-surface zone of the substrate, and deposition of the laser target material on the substrate.