Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe
•Submicron and subwavelength multifunctional structures fabrication on silica substrates using LDW method.•Overcome Abbe limit and obtain the feature size is 130 nm, which is 1/3 of the laser wavelength (405 nm).•High etching selectivity (3.1:1), large area (6 *6 cm2), surface quality (RMS roughness...
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| Veröffentlicht in: | Journal of alloys and compounds 2021-06, Vol.867, p.158988, Article 158988 |
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| container_title | Journal of alloys and compounds |
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| creator | Chen, Guodong Zheng, Jinlun Wang, Zhengwei Zhang, Kui Mo, Zhichang Liu, Xing Gao, Tianyu Wang, Yang Wei, Jingsong |
| description | •Submicron and subwavelength multifunctional structures fabrication on silica substrates using LDW method.•Overcome Abbe limit and obtain the feature size is 130 nm, which is 1/3 of the laser wavelength (405 nm).•High etching selectivity (3.1:1), large area (6 *6 cm2), surface quality (RMS roughness |
| doi_str_mv | 10.1016/j.jallcom.2021.158988 |
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| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2519885472</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0925838821003959</els_id><sourcerecordid>2519885472</sourcerecordid><originalsourceid>FETCH-LOGICAL-c337t-55f668a6fceabc047656e83e033fb493ae9ee7382db34b45709dfd83864158c73</originalsourceid><addsrcrecordid>eNqFkFFLwzAUhYMoOKc_QQj43C1pmjR9kjGcDgY-OJ9Dmt5uKW0zk1Tw35sx3326F-45h3s-hB4pWVBCxbJbdLrvjRsWOcnpgnJZSXmFZlSWLCuEqK7RjFQ5zyST8hbdhdARQmjF6Az5ja69NTpaN2LX4sEa75ajHh0epj7adhrN-aZ7fNIxgh8DPitPMZl6fOh1CDgevZsOR2yOOr1xgNE2gI-gYza4tHkINkS8OmzHj3oP9-im1X2Ah785R5-bl_36Ldu9v27Xq11mGCtjxnkrhNSiNaBrQ4pScAGSAWGsrYuKaagASibzpmZFXfCSVE3bpIqiSARMyebo6ZJ78u5rghBV5yafmgSVc5oQ8aLMk4pfVKl3CB5adfJ20P5HUaLOeFWn_vCqM151wZt8zxcfpArfFrwKxsJooLEeTFSNs_8k_AKZh4gC</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2519885472</pqid></control><display><type>article</type><title>Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe</title><source>ScienceDirect Journals (5 years ago - present)</source><creator>Chen, Guodong ; Zheng, Jinlun ; Wang, Zhengwei ; Zhang, Kui ; Mo, Zhichang ; Liu, Xing ; Gao, Tianyu ; Wang, Yang ; Wei, Jingsong</creator><creatorcontrib>Chen, Guodong ; Zheng, Jinlun ; Wang, Zhengwei ; Zhang, Kui ; Mo, Zhichang ; Liu, Xing ; Gao, Tianyu ; Wang, Yang ; Wei, Jingsong</creatorcontrib><description>•Submicron and subwavelength multifunctional structures fabrication on silica substrates using LDW method.•Overcome Abbe limit and obtain the feature size is 130 nm, which is 1/3 of the laser wavelength (405 nm).•High etching selectivity (3.1:1), large area (6 *6 cm2), surface quality (RMS roughness<1 nm), and fidelity silica structures fabrication.
Heat-mode resists can spatially confine the laser hot spot to achieve subwavelength exposure by laser direct writing. However, due to the lack of systematic research on the dry etching mechanism of them, micro/nano patterning on optical glass materials through heat-mode resists has not been realized with standardized plasma processes. In this paper, the fabrication of sub-wavelength micro/nanostructures on silica substrates through the heat-mode resist is reported. A chalcogenide alloy AgInSbTe (AIST) works as the heat-mode resist. The anti-etching mechanism of the AIST resist in fluorine-based plasma gas was explored with the X-ray photoelectron spectroscopy. High etching selectivity, surface quality, and fidelity are achieved by optimizing the plasma-etching processes. Experimental and theoretical results confirm the effectiveness and feasibility of this technology. A series of micro/nano-pattern structures on silica are prepared, where the minimum feature size is 130 nm, which is about 1/3 the laser wavelength. This work paves an effective and convenient way for the fabrication of subwavelength optical elements on transparent glass substrates.</description><identifier>ISSN: 0925-8388</identifier><identifier>EISSN: 1873-4669</identifier><identifier>DOI: 10.1016/j.jallcom.2021.158988</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>AgInSbTe ; Chalcogenide heat-mode resist ; Chalcogenides ; Direct laser writing ; Fluorine ; Glass substrates ; Lasers ; Optical components ; Optical glass ; Pattern transfer ; Patterning ; Photoelectrons ; Plasma etching ; Resists ; Selectivity ; Silica ; Silicon dioxide ; Sub-wavelength optical element ; Surface properties</subject><ispartof>Journal of alloys and compounds, 2021-06, Vol.867, p.158988, Article 158988</ispartof><rights>2021 Elsevier B.V.</rights><rights>Copyright Elsevier BV Jun 25, 2021</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c337t-55f668a6fceabc047656e83e033fb493ae9ee7382db34b45709dfd83864158c73</citedby><cites>FETCH-LOGICAL-c337t-55f668a6fceabc047656e83e033fb493ae9ee7382db34b45709dfd83864158c73</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.jallcom.2021.158988$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids></links><search><creatorcontrib>Chen, Guodong</creatorcontrib><creatorcontrib>Zheng, Jinlun</creatorcontrib><creatorcontrib>Wang, Zhengwei</creatorcontrib><creatorcontrib>Zhang, Kui</creatorcontrib><creatorcontrib>Mo, Zhichang</creatorcontrib><creatorcontrib>Liu, Xing</creatorcontrib><creatorcontrib>Gao, Tianyu</creatorcontrib><creatorcontrib>Wang, Yang</creatorcontrib><creatorcontrib>Wei, Jingsong</creatorcontrib><title>Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe</title><title>Journal of alloys and compounds</title><description>•Submicron and subwavelength multifunctional structures fabrication on silica substrates using LDW method.•Overcome Abbe limit and obtain the feature size is 130 nm, which is 1/3 of the laser wavelength (405 nm).•High etching selectivity (3.1:1), large area (6 *6 cm2), surface quality (RMS roughness<1 nm), and fidelity silica structures fabrication.
Heat-mode resists can spatially confine the laser hot spot to achieve subwavelength exposure by laser direct writing. However, due to the lack of systematic research on the dry etching mechanism of them, micro/nano patterning on optical glass materials through heat-mode resists has not been realized with standardized plasma processes. In this paper, the fabrication of sub-wavelength micro/nanostructures on silica substrates through the heat-mode resist is reported. A chalcogenide alloy AgInSbTe (AIST) works as the heat-mode resist. The anti-etching mechanism of the AIST resist in fluorine-based plasma gas was explored with the X-ray photoelectron spectroscopy. High etching selectivity, surface quality, and fidelity are achieved by optimizing the plasma-etching processes. Experimental and theoretical results confirm the effectiveness and feasibility of this technology. A series of micro/nano-pattern structures on silica are prepared, where the minimum feature size is 130 nm, which is about 1/3 the laser wavelength. This work paves an effective and convenient way for the fabrication of subwavelength optical elements on transparent glass substrates.</description><subject>AgInSbTe</subject><subject>Chalcogenide heat-mode resist</subject><subject>Chalcogenides</subject><subject>Direct laser writing</subject><subject>Fluorine</subject><subject>Glass substrates</subject><subject>Lasers</subject><subject>Optical components</subject><subject>Optical glass</subject><subject>Pattern transfer</subject><subject>Patterning</subject><subject>Photoelectrons</subject><subject>Plasma etching</subject><subject>Resists</subject><subject>Selectivity</subject><subject>Silica</subject><subject>Silicon dioxide</subject><subject>Sub-wavelength optical element</subject><subject>Surface properties</subject><issn>0925-8388</issn><issn>1873-4669</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNqFkFFLwzAUhYMoOKc_QQj43C1pmjR9kjGcDgY-OJ9Dmt5uKW0zk1Tw35sx3326F-45h3s-hB4pWVBCxbJbdLrvjRsWOcnpgnJZSXmFZlSWLCuEqK7RjFQ5zyST8hbdhdARQmjF6Az5ja69NTpaN2LX4sEa75ajHh0epj7adhrN-aZ7fNIxgh8DPitPMZl6fOh1CDgevZsOR2yOOr1xgNE2gI-gYza4tHkINkS8OmzHj3oP9-im1X2Ah785R5-bl_36Ldu9v27Xq11mGCtjxnkrhNSiNaBrQ4pScAGSAWGsrYuKaagASibzpmZFXfCSVE3bpIqiSARMyebo6ZJ78u5rghBV5yafmgSVc5oQ8aLMk4pfVKl3CB5adfJ20P5HUaLOeFWn_vCqM151wZt8zxcfpArfFrwKxsJooLEeTFSNs_8k_AKZh4gC</recordid><startdate>20210625</startdate><enddate>20210625</enddate><creator>Chen, Guodong</creator><creator>Zheng, Jinlun</creator><creator>Wang, Zhengwei</creator><creator>Zhang, Kui</creator><creator>Mo, Zhichang</creator><creator>Liu, Xing</creator><creator>Gao, Tianyu</creator><creator>Wang, Yang</creator><creator>Wei, Jingsong</creator><general>Elsevier B.V</general><general>Elsevier BV</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20210625</creationdate><title>Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe</title><author>Chen, Guodong ; Zheng, Jinlun ; Wang, Zhengwei ; Zhang, Kui ; Mo, Zhichang ; Liu, Xing ; Gao, Tianyu ; Wang, Yang ; Wei, Jingsong</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c337t-55f668a6fceabc047656e83e033fb493ae9ee7382db34b45709dfd83864158c73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>AgInSbTe</topic><topic>Chalcogenide heat-mode resist</topic><topic>Chalcogenides</topic><topic>Direct laser writing</topic><topic>Fluorine</topic><topic>Glass substrates</topic><topic>Lasers</topic><topic>Optical components</topic><topic>Optical glass</topic><topic>Pattern transfer</topic><topic>Patterning</topic><topic>Photoelectrons</topic><topic>Plasma etching</topic><topic>Resists</topic><topic>Selectivity</topic><topic>Silica</topic><topic>Silicon dioxide</topic><topic>Sub-wavelength optical element</topic><topic>Surface properties</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Chen, Guodong</creatorcontrib><creatorcontrib>Zheng, Jinlun</creatorcontrib><creatorcontrib>Wang, Zhengwei</creatorcontrib><creatorcontrib>Zhang, Kui</creatorcontrib><creatorcontrib>Mo, Zhichang</creatorcontrib><creatorcontrib>Liu, Xing</creatorcontrib><creatorcontrib>Gao, Tianyu</creatorcontrib><creatorcontrib>Wang, Yang</creatorcontrib><creatorcontrib>Wei, Jingsong</creatorcontrib><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of alloys and compounds</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Chen, Guodong</au><au>Zheng, Jinlun</au><au>Wang, Zhengwei</au><au>Zhang, Kui</au><au>Mo, Zhichang</au><au>Liu, Xing</au><au>Gao, Tianyu</au><au>Wang, Yang</au><au>Wei, Jingsong</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe</atitle><jtitle>Journal of alloys and compounds</jtitle><date>2021-06-25</date><risdate>2021</risdate><volume>867</volume><spage>158988</spage><pages>158988-</pages><artnum>158988</artnum><issn>0925-8388</issn><eissn>1873-4669</eissn><abstract>•Submicron and subwavelength multifunctional structures fabrication on silica substrates using LDW method.•Overcome Abbe limit and obtain the feature size is 130 nm, which is 1/3 of the laser wavelength (405 nm).•High etching selectivity (3.1:1), large area (6 *6 cm2), surface quality (RMS roughness<1 nm), and fidelity silica structures fabrication.
Heat-mode resists can spatially confine the laser hot spot to achieve subwavelength exposure by laser direct writing. However, due to the lack of systematic research on the dry etching mechanism of them, micro/nano patterning on optical glass materials through heat-mode resists has not been realized with standardized plasma processes. In this paper, the fabrication of sub-wavelength micro/nanostructures on silica substrates through the heat-mode resist is reported. A chalcogenide alloy AgInSbTe (AIST) works as the heat-mode resist. The anti-etching mechanism of the AIST resist in fluorine-based plasma gas was explored with the X-ray photoelectron spectroscopy. High etching selectivity, surface quality, and fidelity are achieved by optimizing the plasma-etching processes. Experimental and theoretical results confirm the effectiveness and feasibility of this technology. A series of micro/nano-pattern structures on silica are prepared, where the minimum feature size is 130 nm, which is about 1/3 the laser wavelength. This work paves an effective and convenient way for the fabrication of subwavelength optical elements on transparent glass substrates.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/j.jallcom.2021.158988</doi></addata></record> |
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| source | ScienceDirect Journals (5 years ago - present) |
| subjects | AgInSbTe Chalcogenide heat-mode resist Chalcogenides Direct laser writing Fluorine Glass substrates Lasers Optical components Optical glass Pattern transfer Patterning Photoelectrons Plasma etching Resists Selectivity Silica Silicon dioxide Sub-wavelength optical element Surface properties |
| title | Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe |
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