Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe

Fabrication of micro/nano multifunctional patterns on optical glass through chalcogenide heat-mode resist AgInSbTe

•Submicron and subwavelength multifunctional structures fabrication on silica substrates using LDW method.•Overcome Abbe limit and obtain the feature size is 130 nm, which is 1/3 of the laser wavelength (405 nm).•High etching selectivity (3.1:1), large area (6 *6 cm2), surface quality (RMS roughness...

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Veröffentlicht in:Journal of alloys and compounds 2021-06, Vol.867, p.158988, Article 158988
Hauptverfasser: Chen, Guodong, Zheng, Jinlun, Wang, Zhengwei, Zhang, Kui, Mo, Zhichang, Liu, Xing, Gao, Tianyu, Wang, Yang, Wei, Jingsong
Format: Artikel
Sprache:eng
Schlagworte:
AgInSbTe
Chalcogenide heat-mode resist
Chalcogenides
Direct laser writing
Fluorine
Glass substrates
Lasers
Optical components
Optical glass
Pattern transfer
Patterning
Photoelectrons
Plasma etching
Resists
Selectivity
Silica
Silicon dioxide
Sub-wavelength optical element
Surface properties
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Beschreibung
Zusammenfassung:•Submicron and subwavelength multifunctional structures fabrication on silica substrates using LDW method.•Overcome Abbe limit and obtain the feature size is 130 nm, which is 1/3 of the laser wavelength (405 nm).•High etching selectivity (3.1:1), large area (6 *6 cm2), surface quality (RMS roughness
ISSN:0925-8388
1873-4669
DOI:10.1016/j.jallcom.2021.158988