Si-W alloy thin films deposition by magnetron co-sputtering

Si-W alloy thin films deposition by magnetron co-sputtering

Results of experimental studies on Si-W coatings fabrication by magnetron co-sputtering from two sources for electrodynamic structures in millimeter and submillimeter range of electromagnetic waves are presented. Control over sheet resistivity of the resulting coatings by varying the power of a magn...

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Veröffentlicht in:Journal of physics. Conference series 2020-12, Vol.1697 (1), p.12054
Hauptverfasser: Serdobintsev, A A, Starodubov, A V, Kozhevnikov, I O, Galushka, V V, Pavlov, A M, Ryskin, N M
Format: Artikel
Sprache:eng
Schlagworte:
Chemical composition
Coatings
Complex permittivity
Electromagnetic radiation
Frequency ranges
Magnetron sputtering
Physics
Thin films
Tungsten
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Zusammenfassung:Results of experimental studies on Si-W coatings fabrication by magnetron co-sputtering from two sources for electrodynamic structures in millimeter and submillimeter range of electromagnetic waves are presented. Control over sheet resistivity of the resulting coatings by varying the power of a magnetron with a tungsten target is demonstrated. Dependence of complex permittivity of Si-W coatings upon dielectric substrates on chemical composition in the frequency range of 50-70 GHz is studied.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/1697/1/012054