Step by Step Bisacrificial Templates Growth of Bimetallic Sulfide QDs‐Attached MOF Nanosheets for Nonlinear Optical Limiting

Here, the authors first report a bimetallic sulfide quantum dots (QDs)‐attached metal–organic framework (MOF) nanosheets‐based film from bisacrificial templates. By using a step by step bisacrificial templates strategy, MOF CuBDC precursors (BDC = 1,4‐benzenedicarboxylate) and chalcogenidometalates...

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Veröffentlicht in:Advanced optical materials 2021-04, Vol.9 (7), p.n/a
Hauptverfasser: Zhu, Yin‐Di, Kang, Yao, Gu, Zhi‐Gang, Zhang, Jian
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Sprache:eng
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Zusammenfassung:Here, the authors first report a bimetallic sulfide quantum dots (QDs)‐attached metal–organic framework (MOF) nanosheets‐based film from bisacrificial templates. By using a step by step bisacrificial templates strategy, MOF CuBDC precursors (BDC = 1,4‐benzenedicarboxylate) and chalcogenidometalates as the templates can successfully in‐situ assemble Cu2SnS3 (CTS) QDs‐attached CuBDC nanosheets on the functionalized substrate (CTS @ CuBDC film). The obtained CTS QDs possess a uniform size with ≈6.2 nm and are homogeneously dispersed on MOF nanosheets, which results in an improvement of conductivity and represents a semiconductive composite film for optical application. A Z‐scan study under the excitation of a 532 nm laser shows that the CTS @ CuBDC film possesses strong optical limiting (OL) behavior and very low OL thresholds (0.92 J cm−2) as well as large third‐order nonlinear susceptibility (1.9 × 10−6 esu). This work suggests that the step by step bisacrificial templates method is a fascinating and feasible strategy to prepare metal sulfide QDs dispersed MOF hybrid materials, and provides a promising potential candidate for nonlinear optical applications. A film based on bimetallic sulfide quantum dots (QDs)‐attached metal–organic framework (MOF) nanosheets has been prepared by using a step by step bisacrificial templates strategy. The resulting Cu2SnS3 QDs with uniform and ultrasmall size attached on MOF nanosheets possess a strong nonlinear optical limiting effect with 532 nm laser irradiation, which provides a promising candidate for nonlinear optical applications.
ISSN:2195-1071
2195-1071
DOI:10.1002/adom.202002072