Temperature-dependent tribological behavior of MoSx thin films synthesized by HiPIMS

Understanding the interaction between the structure and the tribological properties of sputtered molybdenum disulfide films at elevated temperatures is essential for their use in industrial applications. Therefore, the friction and wear behavior up to of 400°C of one stoichiometric MoS2 and a sub-stoichiometric MoS1.6 film are investigated against 100Cr6 counterparts. With an increasing temperature up to 200°C, the friction decreases, which is attributed to a thermally activated water desorption and an increasing intensity of the (002) basal plane. Due to a passivation mechanism caused by the sulfur defect sites, the friction is lower for the sub-stoichiometric film. Above this temperature the friction increases for both films and failure occurs at 400°C. Therefore, the friction at elevated temperatures result from a complex interaction of re-orientation mechanisms, desorption and oxidation processes. •Sulfur defects contribute to a lower friction at all temperature levels.•Re-orientation mechanisms are facilitated by the increased temperature.•Generation of third body particles occurs more easily due to an elevated temperature.•Transition temperature has to be found at 200 °C.