Effect of oxygen plasma treatment on ITO nanorods films prepared by glancing angle deposition

The effect of oxygen (O2) plasma treatment on indium doped tin oxide (ITO) nanorods films prepared by the ion-assisted electron-beam evaporation with the glancing-angle deposition technique (GLAD) were investigated. The ITO nanorods films were plasma treated in oxygen ambient at different O2 flow rates in the range of 20-100 sccm. The physical microstructures have been investigated by grazing-incident X-ray diffraction (GIXRD) and field-emission scanning electron microscopy (FE-SEM). The electrical and optical properties were characterized by four-point probe measurements and UV-VIS-NIR spectrophotometry, respectively. The results showed that all the ITO nanorods films exhibited as bixbite structure. The morphology of as prepared films showed vertically aligned nanocolumnar with diameter of 50-63 nm cause of the shadowing effect and limited adatom diffusion. In addition, the influence of O2 plasma treatment on electrical and anti-reflection with omnidirectional property of ITO nanorods films were systematically evaluated and discussed in this paper.